Rchr
J-GLOBAL ID：201401028945853328   Update date: Feb. 13, 2024

URABE Keiichiro

ウラベ ケイイチロウ | URABE Keiichiro
Affiliation and department：
Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics

About Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics


Job title： Associate Professor
Homepage URL  (2)： http://www.propulsion.kuaero.kyoto-u.ac.jp/Member:Urabe ,  http://www.propulsion.kuaero.kyoto-u.ac.jp/w/index.php?title=Top&setlang=en
Research field  (7)： Basic plasma science ,  Thin-film surfaces and interfaces ,  Basic plasma science ,  Applied plasma science ,  Chemical reaction and process system engineering ,  Electric/electronic material engineering ,  Aerospace engineering
Research keywords  (13)： Space Electric Propulsion ,  Etching ,  Thin Film Deposition ,  Plasma Processing ,  Cryoplasma ,  Supercritical Fluid plasma ,  Atmospheric Pressure Plasma ,  Plasma Science ,  Plasma Diagnostics ,  Plasma Application ,  Plasma ,  Laser Spectroscopy ,  Microplasma
Research theme for competitive and other funds  (11)：
  • 2022 - 2023 Harmonic impedance spectroscopy and its application to surface monitoring
  • 2021 - 2022 3D visualization of excited species in plasmas by optical pumping method
  • 2020 - 2022 Stabilization of dispersion interferometer utilizing gas reflactive-index dispersion
  • 2019 - 2022 Multi-dimension high-throuput LIF diagnostics for flowing ions from plasmas
  • 2019 - 2021 Absolute-density measurement and precision magnetometry using quantum-state control of plasma excited species
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Papers (55)：
  • Keiichiro Urabe, Minami Toyoda, Yoshinori Matsuoka, Koji Eriguchi. Investigation of small-fraction molecular impurities in high-pressure helium plasmas using optical plasma diagnostic methods. PLASMA SOURCES SCIENCE AND TECHNOLOGY. 2024. 33. 2. 025011
  • Junki Morozumi, Takahiro Goya, Tomohiro Kuyama, Koji Eriguchi, Keiichiro Urabe. In situ electrical monitoring of SiO2/Si structures in low-temperature plasma using impedance spectroscopy. JAPANESE JOURNAL OF APPLIED PHYSICS. 2023. 62. SI. SI1010
  • Yoshihiro Sato, Satoshi Shibata, Kazuko Nishimura, Masayuki Yamasaki, Masashi Murakami, Keiichiro Urabe, Koji Eriguchi. Predicting the effects of plasma-induced damage on p-n junction leakage and its application in the characterization of defect distribution. JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY B. 2022. 40. 6. 062209
  • Seiya Kito, Keiichiro Urabe, Koji Eriguchi. Multi-harmonic analysis in a floating harmonic probe method for diagnostics of electron energy and ion density in low-temperature plasmas. JAPANESE JOURNAL OF APPLIED PHYSICS. 2022. 61. 10. 106002
  • T. Matsuda, T. Hamano, Y. Asamoto, M. Noma, M. Yamashita, S. Hasegawa, K. Urabe, K. Eriguchi. Ion irradiation-induced sputtering and surface modification of BN films prepared by a reactive plasma-assisted coating technique. JAPANESE JOURNAL OF APPLIED PHYSICS. 2022. 61. SI. SI1014
ｍore...
MISC (4)：
Books (2)：
  • Applications of Laser Ablation - Thin Film Deposition, Nanomaterial Synthesis and Surface Modification
    IntechOpen Ltd 2016 ISBN:9789535128120
  • CO2 Laser - Optimisation and Application
    IntechOpen Ltd 2012 ISBN:9789535103516
Lectures and oral presentations  (39)：
  • Study of molecular-impurity decomposition in high-pressure helium dielectric barrier discharge generated in a closed glass cell
    (The 41st Symposium on Plasma Processing 2024)
  • 準安定励起ヘリウム原子を用いた光ポンピング磁気センサの磁場感受性についての検討
    (マグネティックス/マイクロマシン・センサシステム/バイオ・マイクロシステム 合同研究会 2023)
  • Degradation of dielectric film by low-temperature plasma exposure investigated using in-situ impedance spectroscopy method
    (3rd Materials Research Meeting (MRM2023) / 24th International Union of Materials Research Societies-International Conference in Asia (IUMRS-ICA2023) 2023)
  • Development of harmonic spectroscopy method to analyze electric circuit including non-linear resistance and its application to measure plasma and surface parameters
    (The 84th JSAP Autumn Meeting 2023)
  • Diagnostics of Ion Sheath on an AC-Biased Metal Plate Using Time-Resolved Laser-Induced Fluorescence Spectroscopy
    (The 84th JSAP Autumn Meeting 2023)
ｍore...
Education (2)：
  • 2007 - 2012 Kyoto University Graduate School of Engineering Department of Electronic Science and Engineering
  • 2002 - 2007 Kyoto University Faculty of Engineering School of Electric and Electronic Engineering
Professional career (1)：
  • Ph.D. (Kyoto University)
Work history (7)：
  • 2024 - 現在 Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics Associate Professor
  • 2018 - 2024 Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics Assisant Professor
  • 2015 - 2018 Air Liquide Laboratories Researcher
  • 2012 - 2014 Japan Society for the Promotion of Science Research Fellow (PD)
  • 2012 - 2014 The University of Tokyo Department of Advanced Materials Science Research Fellow
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Committee career (15)：
  • 2023 - 現在 The Institute of Electrical Engineers of Japan Investigating R&D Committee: Diagnostics of discharge, plasma, and pulse power
  • 2022 - 現在 Japan Society of Applied Physics Chair of Plasma Wakate (Young Resarchers) Champter
  • 2020 - 現在 日本表面真空学会 関西支部 庶務幹事
  • 2022 - 2023 The 25th International Symposium on Plasma Chemistry (ISPC25) Local Organizing Committee
  • 2021 - 2023 プラズマ・核融合学会 編集委員(2022年度 APP副主査)
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Awards (8)：
  • 2021 - Plasma Electronics Division, The Japan Society of Applied Physics 19th Plasma Electronics Award
  • 2018 - HORIBA Masao Horiba Awards 2018
  • 2014 - ISPlasma 2014 / IC-PLANTS 2014 Best Presentation Award (Oral in Plasma Science)
  • 2013 - MRS-J Award for Encouragement of Research in Materials Science
  • 2013 - 16th International Symposium on Laser-Aided Plasma Diagnostics Prize for the Best Combination of Pre-Poster Talk and Poster Presentation
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Association Membership(s) (5)：
The Japan Society of Plasma Science and Nuclear Fusion Research ,  The Japan Society of Vacuum and Surface Science ,  The Japan Society for Aeronautical and Space Sciences ,  Division of Plasma Electronics, The Japan Society of Applied Physics ,  The Japan Society of Applied Physics
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