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J-GLOBAL ID:201402230317417346   Reference number:14A0426434

EFFECT OF O2 INTRODUCTION PROPERTY OF Al DOPED CeO2 FILMS DEPOSITED BY SPUTTERING METHOD

スパッタリング法で堆積したAlドープCeO2膜の酸素導入効果
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Issue: 32  Page: 46-51  Publication year: Mar. 2014 
JST Material Number: L0263A  ISSN: 0914-2908  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Oxide thin films 
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