Art
J-GLOBAL ID:201402230648606220   Reference number:14A1031498

Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining (CMP/P-CVM) Combined Processing of Hard-to-Process Crystals Based on Innovative Concepts

革新的概念に基づく処理困難な結晶の新しい化学機械研磨/プラズマ化学的気化加工法複合加工法(CMP/P-CVM)
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Material:
Volume: 26  Issue:Page: 403-415  Publication year: 2014 
JST Material Number: L0338A  ISSN: 0914-4935  CODEN: SENMER  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
Reference (7):
  • Nikkei Electronics (2011.12.21) p. 67.
  • W. Saito, I. Omura, T. Ogura and H. Ohashi: Solid State Electron. 48 (2004) 1555.
  • T. Doi, I. D. Marinescu and S. Kurokawa: Advances in CMP Polishing Technologies (Elsevier, New York, 2012) Chap. 5, p. 40.
  • Y. Sano, M. Watanabe, T. Kato, K. Yamamura, H. Miura and K. Yamauchi: Mater. Sci. Forum 600-603 (2009) 847.
  • T. Doi: Details of Semiconductor CMP Technology (Kogyo-chosakai Publishing Co., Tokyo, 2001) (in Japanese).
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