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J-GLOBAL ID：201502251944175824   Reference number：15A0225060

Ge結晶薄膜の低温合成:フレキシブルデバイスへの応用を目指して

Author (1)：
KYUNO KENTARO

About KYUNO KENTARO

(芝浦工大)

About 芝浦工大


Material：
真空ジャーナル  (Journal of Japan Vacuum Industry Association)

About 真空ジャーナル


Issue： 151  Page： 13-15  Publication year： Jan. 15, 2015 
JST Material Number： L8030A  ISSN： 1883-1052  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*germanium

About germanium

, 
chemical synthesis

About chemical synthesis

, 
crystallization

About crystallization

, 
*flexible circuit board

About flexible circuit board

, 
*semiconductor thin film

About semiconductor thin film

, 
surfactant

About surfactant


Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
surfactant

About surfactant

, 
metal induced crystallization

About metal induced crystallization

, 
Low-temperature synthesis

About Low-temperature synthesis


JST classification (1)：
JST classification
Category name(code) classified by JST.
Materials of solid-state devices 
(NC03020K)

About Materials of solid-state devices

Terms in the title (6)：
Terms in the title
Keywords automatically extracted from the title.
Ge

About Ge

, 
結晶

About 結晶

, 
薄膜

About 薄膜

, 
低温合成

About 低温合成

, 
フレキシブルデバイス

About フレキシブルデバイス

, 
応用

About 応用


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