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J-GLOBAL ID：201602204410316384   Reference number：16A0260077

Uneven Distribution of Silicon Crystalline Grains in RF-Sputtered β-FeSi₂ Films Deposited on Off-Oriented Silicon Substrate

オフ角シリコン基板上に製膜したβ-FeSi₂RFスパッタ膜におけるシリコン結晶粒の偏在

Author (3)： UEMATSU T. (Dep. of Electrical and Electronic Engineering, Graduate School of Sci. and Engineering, Kansai Univ.) ,  NAKAMURA K. (Dep. of Electrical and Electronic Engineering, Graduate School of Sci. and Engineering, Kansai Univ.) ,  NAKAMURA K. (Dep. of Electrical and Electronic Engineering, Fac. of Engineering Sci., Kansai Univ.)
Material： Transactions of the Materials Research Society of Japan  (Trans Mater Res Soc Jpn)
Volume： 41  Issue： 1  Page： 97-100 (J-STAGE)  Publication year： 2016 
JST Material Number： L4468A  ISSN： 1382-3469  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *silicide ,  *iron compound ,  RF sputtering ,  *sputtered deposition ,  *evaporated film ,  *substrate (plate) ,  *silicon ,  *crystal grain ,  heterogeneity ,  distribution ,  annealing (heat treatment) ,  *crack ,  *iron silicide
Semi thesaurus term： anneal ,  inhomogeneous distribution

JST classification (2)： Solar cell  (NC03084O) ,  Thin films of other inorganic compounds  (BK14060A)

Reference (12)：

• [1] N. Otogawa, S. Wang, S. Kihara, X. Liu, Y. Fukuzawa, Y. Suzuki, M. Osamura, T. Ootsuka, T. Mise, K. Miyake, Y. Nakayama, H. Tanoue, Y. Makita, Thin Solid Films 461, 223 (2004).
• [2] T. Yoshitake, Y. Inokuchi and A. Yuri, Appl. Phys. Lett. 88, 182104 (2006).
• [3] M. C. BOST and J. E. MAHAN, J. Appl. Phys. 64, 2034 (1988).
• [4] T. Kawaguchi and K. Nakamura, Tech. Digest of 2009 International Meeting for Future of Electron Devices, Kansai 92 (2009).
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Terms in the title (5)： オフ角 ,  シリコン基板 ,  製膜 ,  スパッタ膜 ,  シリコン結晶