Art

J-GLOBAL ID：201602209123896312   Reference number：16A0118518

Synthesis of Large-Sized Single-Crystal Hexagonal Boron Nitride Domains on Nickel Foils by Ion Beam Sputtering Deposition

イオンビームスパッタリング堆積による,ニッケルホイル上の大粒径単結晶六方晶系窒化ホウ素分域の合成

Author (9)： WANG Haolin (Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN) ,  ZHANG Xingwang (Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN) ,  LIU Heng (Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN) ,  YIN Zhigang (Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN) ,  MENG Junhua (Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN) ,  XIA Jing (Key Lab of Photochemical Conversion and Optoelectronic Materials, Technical Inst. of Physics and Chemistry, Chinese ...) ,  MENG Xiang-Min (Key Lab of Photochemical Conversion and Optoelectronic Materials, Technical Inst. of Physics and Chemistry, Chinese ...) ,  WU Jinliang (Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN) ,  YOU Jingbi (Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN)
Material： Advanced Materials  (Adv Mater (Deerfield, Fla.))
Volume： 27  Issue： 48  Page： 8109-8115  Publication year： Dec. 2015 
JST Material Number： W0001A  ISSN： 0935-9648  CODEN： ADVMEW  Document type： Article
Article type： 短報  Country of issue： Germany, Federal Republic of (DEU)  Language： ENGLISH (EN)

Thesaurus term： *ion beam sputtering ,  *sputtered deposition ,  Nickel ,  *boron nitride ,  *single crystal ,  *crystal nucleation ,  *nucleation ,  treatment ,  parameter ,  active site ,  concentration (ratio) ,  domain ,  electron microscopy ,  Microscopy ,  surface roughness ,  X-ray photoelectron spectroscopy ,  ultraviolet and visible absorption spectrum ,  dependence ,  growth parameters ,  surface concentration ,  Microscopy, Atomic Force ,  fluence dependency ,  Scanning Electron Microscopy ,  *hexagonal boron nitride
Semi thesaurus term： in situ treatment ,  atomic force microscopy ,  dose dependency ,  scanning electron microscopy ,  *heterogeneous nucleation ,  *hexagonal boron nitride

JST classification (4)： Techniques and equipment of thin film deposition  (BK14020I) ,  Sputtering  (BK16110U) ,  Salts  (CD01050V) ,  Crystal growth of other inorganic compounds  (BK13060T)

Terms in the title (7)： イオンビームスパッタリング ,  堆積 ,  ニッケル ,  大粒径 ,  単結晶 ,  六方晶系窒化ホウ素 ,  分域