Art
J-GLOBAL ID:201602210299656863
Reference number:16A0030583
Lithography process simulation studies using coarse-grained polymer models
粗視化重合体モデルを用いたリソグラフィープロセスシミュレーション研究
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Author (1):
Material:
Volume:
48
Issue:
1
Page:
45-50
Publication year:
Jan. 2016
JST Material Number:
F0612A
ISSN:
0032-3896
CODEN:
POLJB8
Document type:
Article
Article type:
文献レビュー
Country of issue:
Germany, Federal Republic of (DEU)
Language:
ENGLISH (EN)
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Semi thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
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JST classification (1):
JST classification
Category name(code) classified by JST.
Polymer chemistry in general
Reference (18):
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ITRS working group. International Technology Roadmap for Semiconductors. http://www.itrs.net/. (2013).
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Doi, M., OCTA http://octa.jp/. (2002) Accessed 4 May 2015.
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Morita, H. & Doi, M. Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughness. Proc. SPIE 7273, 727337 (2009).
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Morita, H. & Doi, M. Mesoscale simulation of line-edge structures based on polymer chains in development and rinse processes. J. Micro/Nanolith. MEMS MOEMS. 9, 041213 (2010).
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Morita, H. Meso-scale simulation of the line-edge structure based on resist polymer molecules by negative-tone process. Proc. SPIE 7972, 79720W (2011).
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