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J-GLOBAL ID:201702214650287241   Reference number:17A0873491

Growth of high quality nitride semiconductors by sputtering and its application to device fabrication

スパッタリング法による高品質窒化物半導体の形成とデバイス応用
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Volume: 86  Issue:Page: 576-580  Publication year: Jul. 10, 2017 
JST Material Number: F0252A  ISSN: 0369-8009  CODEN: OYBSA  Document type: Article
Article type: 解説  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Semiconductor thin films 
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