Art

J-GLOBAL ID：201702217903470328   Reference number：17A1764172

Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization

均一な円形ターゲット利用のための回転十字型磁化高周波スパッタリングプラズマ源

Author (4)： Ide Tsubasa (Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan) ,  Hossain Md. Amzad (Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan and Department of Electrical and Electronic Engineering, Jessore University of Science and Technology, Jessore 7408, Bangladesh) ,  Nakamura Yutaro (Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan) ,  Ohtsu Yasunori (Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan)
Material： Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films  (Journal of Vacuum Science and Technology. A. Vacuum, Surfaces, and Films)
Volume： 35  Issue： 6  Page： 061312-061312-6  Publication year： Nov. 2017 
JST Material Number： C0789B  ISSN： 0734-2101  CODEN： JVTAD6  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： *RF sputtering ,  *magnetron sputtering ,  *plasma source ,  *permanent magnet ,  electric field ,  magnetic field ,  electric discharge ,  *Langmuir probe ,  target ,  plasma discharge
Semi thesaurus term： *radio frequency sputtering ,  neodymium permanent magnet ,  Langmuir probe

JST classification (3)： Plasma diagnostics  (BJ02090L) ,  Gas discharges  (BJ03020T) ,  Techniques and equipment of thin film deposition  (BK14020I)

Terms in the title (6)： 円形 ,  ターゲット ,  十字型 ,  磁化 ,  高周波スパッタリング ,  プラズマ源