Art
J-GLOBAL ID:201702252406991392   Reference number:17A1458529

Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition

a-に取込まれたクラスタの体積分率におけるヒステリシス:SiH_4プラズマ化学蒸着により堆積した【Powered by NICT】
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Volume: 326  Issue: PB  Page: 388-394  Publication year: 2017 
JST Material Number: D0205C  ISSN: 0257-8972  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Suppressing cluster incorporat...
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Thin films of other inorganic compounds 
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