Art

J-GLOBAL ID：201702263920898151   Reference number：17A1220441

Contribution of nitrogen to the photoinduced deformation of amorphous carbon nitride films

非晶質窒化炭素膜の光誘起変形への窒素の寄与

Author (4)： HARATA Tomo (National Defense Acad., Kanagawa, JPN) ,  AONO Masami (National Defense Acad., Kanagawa, JPN) ,  KITAZAWA Nobuaki (National Defense Acad., Kanagawa, JPN) ,  WATANABE Yoshihisa (National Defense Acad., Kanagawa, JPN)
Material： Japanese Journal of Applied Physics  (JJAP)
Volume： 55  Issue： 1S  Page： 01AA01.1-01AA01.4  Publication year： Jan. 2016 
JST Material Number： G0520B  ISSN： 0021-4922  CODEN： JJAPB6  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Thesaurus term： *carbon compound ,  *nitride ,  *membrane and film ,  *photoirradiation ,  *deformation ,  *doping ,  silicon ,  ultrathin film ,  *bending (material phenomenon) ,  curvature ,  concentration dependence ,  triple bond ,  *carbon nitride ,  *amorphous film ,  *visible light irradiation ,  *nitrogen doping
Semi thesaurus term： silicon

JST classification (3)： Thin films of other inorganic compounds  (BK14060A) ,  Mechanics of elasticity in general  (HC02010M) ,  Photochemistry in general  (CB08010U)

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Terms in the title (5)： 非晶質 ,  窒化 ,  炭素膜 ,  光誘起 ,  窒素