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J-GLOBAL ID：201802227680627383   Reference number：18A2167773

Deposition of ZrON thin films by reactive magnetron sputtering using a hollow cylindrical target

中空円筒ターゲットを用いた反応性マグネトロンスパッタリングによるZrON薄膜の堆積【JST・京大機械翻訳】

Author (8)： Iwata Hiroshi (Department of Physics, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan) ,  Ishii Hiroki (Department of Physics, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan) ,  Kato Daiki (Department of Physics, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan) ,  Kawashima Shohei (Department of Physics, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan) ,  Kodama Kakeru (Department of Physics, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan) ,  Furusawa Masashi (Department of Physics, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan) ,  Tanaka Masatoshi (Department of Physics, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan) ,  Sekiya Takao (Department of Physics, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan)
Material： Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films  (Journal of Vacuum Science and Technology. A. Vacuum, Surfaces, and Films)
Volume： 36  Issue： 6  Page： 061509-061509-7  Publication year： 2018 
JST Material Number： C0789B  ISSN： 0734-2101  CODEN： JVTAD6  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： ZrON films were prepared on qu...

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Thesaurus term： *thin film ,  flow rate ,  X-ray diffractometry ,  crystal ,  cathode ,  X-ray ,  argon ,  substrate(plate) ,  X-ray diffraction ,  gas flow ,  cylinder(machine element) ,  binding energy ,  crystallinity ,  silica glass ,  oxidation-reduction potential ,  spectroscopy

JST classification (2)： Thin films of other inorganic compounds  (BK14060A) ,  Oxide thin films  (BK14050P)

Terms in the title (5)： 中空円筒 ,  ターゲット ,  反応性マグネトロンスパッタリング ,  薄膜 ,  堆積