Art

J-GLOBAL ID：201802258304584008   Reference number：18A2026697

Skin Effect Suppressed NiFe/Cu Electroplated Multilayer Wiring for High Data-Rate and Low Delay-Time I/O Interface Board.

高データレートおよび低遅延時間I/Oインタフェイスボードのための表皮効果抑制NiFe/Cu電気めっき多層配線【JST・京大機械翻訳】

Author (8)： Yamaguchi M. (Department of Electrical Engineering, Tohoku University, Sendai, Japan) ,  Yanai T. (Division of Electrical Engineering and Computer Science, Nagasaki University, Nagasaki, Japan) ,  Nakayama H. (Department of Electronics and Control Engineering, National Institute of Technology, Nagano College, Nagano, Japan) ,  Sai R. (New Industry Creation Hachery Center, Tohoku University, Sendai, Japan) ,  Fujiwara H. (Electronic Materials Business Division, Automotive & Industrial Systems Company, Panasonic Corporation, Kadoma, Japan) ,  Kitai Y. (Electronic Materials Business Division, Automotive & Industrial Systems Company, Panasonic Corporation, Kadoma, Japan) ,  Sato M. (Electronic Materials Business Division, Automotive & Industrial Systems Company, Panasonic Corporation, Kadoma, Japan) ,  Sangawa U. (Electronic Materials Business Division, Automotive & Industrial Systems Company, Panasonic Corporation, Kadoma, Japan)
Material： IEEE Conference Proceedings  (IEEE Conf Proc)
Volume： 2018  Issue： INTERMAG  Page： 1  Publication year： 2018 
JST Material Number： W2441A  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： This paper proposes a new appl...

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Thesaurus term： mass production ,  *skin effect ,  *multilayer interconnection ,  *Copper ,  smoothing ,  conductor ,  *multilayer ,  high speed ,  transmission loss ,  Magnetics ,  *interface ,  *Electroplating ,  complex magnetic permeability ,  large area ,  *low delay

JST classification (1)： Graphic and image processing in general  (JE04010I)

Terms in the title (8)： データレート ,  低遅延 ,  インタフェイス ,  ボード ,  表皮効果 ,  Cu ,  電気めっき ,  多層配線