Art
J-GLOBAL ID:201802271147950243   Reference number:18A0910847

Dependences of deposition rate and OH content on concentration of added trichloroethylene in low-temperature silicon oxide films deposited using silicone oil and ozone gas

シリコーン油とオゾンガスを用いて堆積させた低温酸化ケイ素膜中における添加トリクロロエチレン濃度に対する堆積速度とOH含有量の依存性
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Material:
Volume: 57  Issue: 3S1  Page: 03DA02.1-03DA02.7  Publication year: Mar. 2018 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Oxide thin films  ,  Techniques and equipment of thin film deposition 
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