Art

J-GLOBAL ID：201802274841665708   Reference number：18A1944687

Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges

反応性高出力パルススパッタリングPenning放電による窒化チタン膜の作製【JST・京大機械翻訳】

Author (4)： Kimura Takashi (Graduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya, 466-8555, Japan) ,  Yoshida Ryo (Graduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya, 466-8555, Japan) ,  Azuma Kingo (Department of Electrical Materials and Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo, 671-2280, Japan) ,  Nakao Setsuo (National Institute of Advanced Industrial Science and Technology (AIST) - Chubu, 2266-98 Anagahora, Moriyama, Nagoya, 463-8560, Japan)
Material： Vacuum
Volume： 157  Page： 192-201  Publication year： 2018 
JST Material Number： E0347A  ISSN： 0042-207X  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Abstract/Point： Titanium carbon nitride (TiCN)...

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Thesaurus term： transmission electron microscope ,  *Titanium ,  peak value ,  *pulse ,  chemical composition ,  hardness ,  friction coefficient ,  crystal grain size (diameter) ,  concurrency ,  Elastic Modulus ,  electron microscopy ,  *nitriding ,  X-ray photoelectron spectrum ,  *reactivity ,  compressive stress ,  carbon nitride ,  *modification
Semi thesaurus term： ピーク電力 , 【Automatic Indexing@JST】

JST classification (2)： Thin films of other inorganic compounds  (BK14060A) ,  Mechanical properties of solids in general  (BL01021C)

Terms in the title (8)： 反応性 ,  高出力 ,  パルス ,  スパッタリング ,  Penning放電 ,  窒化 ,  チタン膜 ,  作製