Art

J-GLOBAL ID：201902216013603723   Reference number：19A0737887

Effects of NH₃ flow on structural and optical properties of ZnO films grown by atmospheric-pressure chemical vapor deposition

大気圧化学蒸着により成長させたZnO膜の構造と光学特性に及ぼすNH_3流の影響【JST・京大機械翻訳】

Author (3)： Terasako Tomoaki (Graduate School of Science & Engineering, Ehime University, 3 Bunkyo-cho, Matsuyama, Ehime 790-8577, Japan) ,  Ogura Yoshinori (Graduate School of Science & Engineering, Ehime University, 3 Bunkyo-cho, Matsuyama, Ehime 790-8577, Japan) ,  Yagi Masakazu (National Institute of Technology, Kagawa College, 551 Koda, Takuma-cho, Mitoyo, Kagawa 769-1192, Japan)
Material： Thin Solid Films
Volume： 675  Page： 50-58  Publication year： 2019 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Abstract/Point： Structural and optical propert...

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Thesaurus term： passivation ,  Zinc ,  light emission ,  photoluminescence ,  Ammonia ,  excitation (physics) ,  X-ray photoelectron spectrum ,  *chemical vapor deposition ,  *optical property ,  donor ,  X-ray photoelectron spectroscopy ,  band gap ,  acceptor ,  doping ,  impurity level ,  *zinc oxide ,  modification

Author keywords (6)： Zinc oxide ,  Chemical vapor deposition ,  Photoluminescence ,  Photoluminescence excitation spectroscopy ,  Photoacoustic spectroscopy ,  X-ray photoelectron spectroscopy

JST classification (1)： Oxide thin films  (BK14050P)

Terms in the title (4)： 大気圧化学蒸着 ,  成長 ,  ZnO ,  光学特性