Art
J-GLOBAL ID：201902278983962962   Reference number：19A0909558

Improvement of CD stability and defectivity in resist coating and developing process in EUV lithography process

EUVリソグラフィープロセスにおけるレジスト被覆と現像プロセスにおけるCD安定性と欠陥性の改善【JST・京大機械翻訳】
Author (9)：
Kamei Yuya

About Kamei Yuya

(Tokyo Electron Kyushu Ltd. (Japan))

About Tokyo Electron Kyushu Ltd. (Japan)

, 
Kawakami Shinichiro

About Kawakami Shinichiro

(Tokyo Electron Kyushu Ltd. (Japan))

About Tokyo Electron Kyushu Ltd. (Japan)

, 
Tadokoro Masahide

About Tadokoro Masahide

(Tokyo Electron Kyushu Ltd. (Japan))

About Tokyo Electron Kyushu Ltd. (Japan)

, 
Hashimoto Yusaku

About Hashimoto Yusaku

(Tokyo Electron Kyushu Ltd. (Japan))

About Tokyo Electron Kyushu Ltd. (Japan)

, 
Shimoaoki Takeshi

About Shimoaoki Takeshi

(Tokyo Electron Kyushu Ltd. (Japan))

About Tokyo Electron Kyushu Ltd. (Japan)

, 
Enomoto Masashi

About Enomoto Masashi

(Tokyo Electron Kyushu Ltd. (Japan))

About Tokyo Electron Kyushu Ltd. (Japan)

, 
Nafus Kathleen

About Nafus Kathleen

(Tokyo Electron Kyushu Ltd. (Japan))

About Tokyo Electron Kyushu Ltd. (Japan)

, 
Sonoda Akihiro

About Sonoda Akihiro

(Tokyo Electron Kyushu Ltd. (Japan))

About Tokyo Electron Kyushu Ltd. (Japan)

, 
Foubert Philippe

About Foubert Philippe

(IMEC (Belgium))

About IMEC (Belgium)


Material：
Proceedings of SPIE  (Proceedings. SPIE - The International Society for Optical Engineering)

About Proceedings of SPIE


Volume： 10809  Page： 1080924-7  Publication year： 2018 
JST Material Number： D0943A  ISSN： 0277-786X  CODEN： PSISDG  Document type： Proceedings
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
Abstract/Point：
Abstract/Point
Japanese summary of the article(about several hundred characters).
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EUV lithography will to be bro...
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Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
scanner

About scanner

, 
*covering

About covering

, 
mass production

About mass production

, 
*development (photography)

About development (photography)

, 
coater

About coater

, 
criticality

About criticality

, 
*resist

About resist

, 
electric contact hole

About electric contact hole

, 
water droplet

About water droplet

, 
coating material (cover)

About coating material (cover)

, 
optimization

About optimization

, 
modification

About modification


Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
開発プロセス

About 開発プロセス

, 
CD均一性

About CD均一性

, 
*EUVリソグラフィー

About EUVリソグラフィー

, 【Automatic Indexing@JST】
JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (7)：
Terms in the title
Keywords automatically extracted from the title.
EUVリソグラフィー

About EUVリソグラフィー

, 
プロセス

About プロセス

, 
レジスト

About レジスト

, 
現像

About 現像

, 
Cd

About Cd

, 
安定性

About 安定性

, 
欠陥

About 欠陥


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