Art

J-GLOBAL ID：202002218076835904   Reference number：20A1235581

Preparation of two-dimensional thin films by backside irradiation pulsed laser deposition method using powder target

粉末ターゲットを用いた背面照射パルスレーザ蒸着法による二次元薄膜の作製

Author (6)： Kawasaki Hiroharu (National Institute of Technology, Sasebo College, Sasebo, Nagasaki 857-1193, Japan) ,  Ohshima Tamiko (National Institute of Technology, Sasebo College, Sasebo, Nagasaki 857-1193, Japan) ,  Yagyu Yoshihito (National Institute of Technology, Sasebo College, Sasebo, Nagasaki 857-1193, Japan) ,  Ihara Takeshi (National Institute of Technology, Sasebo College, Sasebo, Nagasaki 857-1193, Japan) ,  Shinohara Masanori (National Institute of Technology, Sasebo College, Sasebo, Nagasaki 857-1193, Japan) ,  Suda Yoshiaki (National Institute of Technology, Ishikawa College, Tsubata, Ishikawa 929-0392, Japan)
Material： Japanese Journal of Applied Physics  (JJAP)
Volume： 59  Issue： SA  Page： SAAC01 (5pp)  Publication year： Jan. 2020 
JST Material Number： G0520B  ISSN： 0021-4922  CODEN： JJAPB6  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Thesaurus term： *pulsed laser deposition ,  target ,  *metal powder ,  Zinc ,  pulsed laser irradiation ,  two dimension ,  *metallic thin film ,  X-ray photoelectron spectroscopy ,  wafer ,  silicon ,  Indium ,  silica glass ,  space resolving power ,  spectroscopy ,  rate of sedimentation ,  iridium oxide ,  zinc powder ,  back face ,  Si wafer
Semi thesaurus term： silicon substrate

JST classification (2)： Metallic thin films  (BK14030T) ,  Laser irradiation effects and damages  (BK16040S)

Terms in the title (6)： 粉末 ,  ターゲット ,  背面 ,  パルスレーザ蒸着 ,  薄膜 ,  作製