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J-GLOBAL ID:202002225780460503   Reference number:20A2575581

Combined infrared reflectance and Raman spectroscopy analysis of Si-doping limit of GaN

GaNのSiドーピング限界の結合赤外反射率とRaman分光分析【JST・京大機械翻訳】
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Material:
Volume: 117  Issue: 19  Page: 192103-192103-6  Publication year: 2020 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Heavily Si-doped GaN layers gr...
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Lattice defects in semiconductors  ,  Infrared and Raman spectra of inorganic molecules  ,  Infrared spectra,Raman scattering and Raman spectra of semiconductors  ,  Semiconductor thin films 
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