Art

J-GLOBAL ID：202002262818246114   Reference number：20A2568025

Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources

二重プラズマ源を用いた化学支援スパッタリングによるGaN膜成長における原子窒素/水素の役割【JST・京大機械翻訳】

Author (14)： Tanide Atsushi (Rakusei Operation Center, SCREEN Holdings Co., Ltd., Japan) ,  Nakamura Shohei (Rakusei Operation Center, SCREEN Holdings Co., Ltd., Japan) ,  Nakamura Shohei (Center for Low-Temperature Plasma Sciences, Nagoya University, Aichi, Japan) ,  Horikoshi Akira (Rakusei Operation Center, SCREEN Holdings Co., Ltd., Japan) ,  Takatsuji Shigeru (Rakusei Operation Center, SCREEN Holdings Co., Ltd., Japan) ,  Kimura Takahiro (Rakusei Operation Center, SCREEN Holdings Co., Ltd., Japan) ,  Kimura Takahiro (Center for Low-Temperature Plasma Sciences, Nagoya University, Aichi, Japan) ,  Kinose Kazuo (Rakusei Operation Center, SCREEN Holdings Co., Ltd., Japan) ,  Nadahara Soichi (Rakusei Operation Center, SCREEN Holdings Co., Ltd., Japan) ,  Nishikawa Masazumi (EMD Corp, Shiga, Japan) ,  Ebe Akinori (EMD Corp, Shiga, Japan) ,  Ishikawa Kenji (Center for Low-Temperature Plasma Sciences, Nagoya University, Aichi, Japan) ,  Oda Osamu (Center for Low-Temperature Plasma Sciences, Nagoya University, Aichi, Japan) ,  Hori Masaru (Center for Low-Temperature Plasma Sciences, Nagoya University, Aichi, Japan)
Material： ACS Omega
Volume： 5  Issue： 41  Page： 26776-26785  Publication year： 2020 
JST Material Number： W5044A  ISSN： 2470-1343  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： The growth of sputtered GaN at...

Register(free) or Log In to access     To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=20A2568025&from=J-GLOBAL&jstjournalNo=W5044A") }}

Thesaurus term： low temperature ,  Argon ,  *Gallium ,  *Hydrogen ,  *Nitrogen ,  *plasma source ,  aluminum nitride ,  *gallium nitride ,  *thin film growth ,  X-ray photoelectron spectroscopy ,  HEMT ,  growth rate ,  atomic hydrogen ,  sapphire substrate ,  flow ratio

JST classification (1)： Semiconductor thin films  (BK14040E)

Terms in the title (10)： プラズマ源 ,  化学 ,  支援 ,  スパッタリング ,  GaN ,  膜成長 ,  原子 ,  窒素 ,  水素 ,  役割