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J-GLOBAL ID：202002268122888895   Reference number：20A2365669

Modifying the crystal structures of Fe₂O₃-doped NiO epitaxial thin films grown at room temperature by controlling the oxygen partial pressure

酸素分圧制御による室温で成長させたFe_2O_3ドープNiOエピタキシャル薄膜の結晶構造の修正【JST・京大機械翻訳】

Author (18)： Seo Okkyun (Synchrotron X-ray Group, Research Center for Advanced Measurement and Characterization, National Institute for Materials Science (NIMS), Kouto, Sayo, Hyogo 679-5148, Japan) ,  Seo Okkyun (Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan) ,  Tayal Akhil (Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan) ,  Kim Jaemyung (Synchrotron X-ray Group, Research Center for Advanced Measurement and Characterization, National Institute for Materials Science (NIMS), Kouto, Sayo, Hyogo 679-5148, Japan) ,  Kim Jaemyung (Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan) ,  Song Chulho (Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan) ,  Katsuya Yoshio (Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan) ,  Sakata Osami (Synchrotron X-ray Group, Research Center for Advanced Measurement and Characterization, National Institute for Materials Science (NIMS), Kouto, Sayo, Hyogo 679-5148, Japan) ,  Sakata Osami (Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo 679-5148, Japan) ,  Sakata Osami (Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan) ,  Sakata Osami (Center for Synchrotron Radiation Research, Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Koto, Sayo, Hyogo 679-5198, Japan) ,  Tang Jiayi (Graduate School of Engineering, University of Hyogo, 2167, Shosha, Himeji, Hyogo 671-2280, Japan) ,  Lee Nodo (Materials & Devices Advanced Research Institute, LG Electronics, 10, Magokjungang-ro, Gangseo-gu, Seoul 07796, Republic of Korea) ,  Kim Yong Tae (Department of Chemical Engineering & Biotechnology, Korea Polytechnic University, 237 Sangidaehak-ro, Siheung-si, Republic of Korea) ,  Ikeya Yuki (Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan) ,  Takano Shiori (Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan) ,  Matsuda Akifumi (Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan) ,  Yoshimoto Mamoru (Department of Materials Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori, Yokohama 226-8502, Japan)
Material： Applied Surface Science  (Appl Surf Sci)
Volume： 533  Page： Null  Publication year： 2020 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Abstract/Point： Herein, we investigated the in...

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Thesaurus term： X-ray diffraction ,  *epitaxy ,  *crystal structure ,  lattice distortion ,  electrical resistivity ,  *thin film ,  *iron ,  *nickel ,  X-ray diffractometry ,  valence ,  *doping ,  structural phase transition ,  *thin film growth ,  pulsed laser deposition
Semi thesaurus term： *酸素分圧 ,  直接遷移 , 【Automatic Indexing@JST】

Author keywords (6)： Oxygen partial pressure ,  Crystal structure ,  Epitaxial growth at room temperature ,  X-ray diffraction ,  X-ray absorption fine structure ,  Optical bandgap

JST classification (1)： Oxide thin films  (BK14050P)

Terms in the title (7)： 酸素分圧 ,  室温 ,  成長 ,  ドープ ,  エピタキシャル ,  薄膜 ,  結晶構造