Art

J-GLOBAL ID：202102230187255387   Reference number：21A0084752

Direct Preparation of Mixed Self-assembled Monolayers Based on Common-substructure-tailored Phosphonic Acids for Fine Control of Surface Wettability

表面濡れ性の精密制御のための共通基礎構造調整ホスホン酸に基づく混合自己組織化単分子層の直接調製

Author (6)： Higashino Toshiki (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Kuribara Kazunori (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Toda Naoya (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Uemura Sei (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Tachibana Hiroaki (National Institute of Advanced Industrial Science and Technology (AIST)) ,  Azumi Reiko (National Institute of Advanced Industrial Science and Technology (AIST))
Material： Chemistry Letters (Web)
Volume： 49  Issue： 11  Page： 1302-1305(J-STAGE)  Publication year： 2020 
JST Material Number： U1704A  ISSN： 1348-0715  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *wetting (liquid) ,  *monomolecular layer ,  self-organizing ,  organic semiconductor ,  ink ,  thin film transistor ,  mixture ,  contact angle ,  Microscopy ,  *phosphonic acid ,  Microscopy, Atomic Force ,  *surface wettability ,  *self-assembled monolayer
Semi thesaurus term： *self-assembled monolayer

Author keywords (3)： Self-assembled monolayers ,  Surface wettability control ,  Printed electronics

JST classification (2)： Solid-liquid interface  (CB12050B) ,  Organop phosphorus compounds  (CF08040N)

Substance index (2)： Octadecylphosphonic acid ,  18-(anthracen-2-yl)octadecylphosphonic acid

Reference (53)：

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Terms in the title (6)： 表面濡れ性 ,  精密制御 ,  基礎構造 ,  ホスホン酸 ,  自己組織化単分子層 ,  調製