Rchr

J-GLOBAL ID：200901004223661630 Update date: Mar. 02, 2024

Watanabe Takeo

ワタナベタケオ | Watanabe Takeo

Affiliation and department：
Job title： Full professor
Homepage URL (2)： http://www.lasti.u-hyogo.ac.jp , https://www.lasti.u-hyogo.ac.jp/english/index.html

Research field (2)： Electronic devices and equipment , Optical engineering and photonics

Research keywords (2)： Electronic device・Instrumentation engineering , Applied optics・quantum optical enginnering

Research theme for competitive and other funds (11)：

2015 - 2018 Precise measurement of optical constants of thin films in soft X-ray region
2013 - 2016 Development of 1X nm EUV Resist with high sensitivity and Low LWR
2010 - 2012 Resist pattern replication using EUV interference lithography for 20 nm and below
2003 - 2005 Chemical genetics on protein acetylation, a key reaction regulating biological functions
1999 - 2001 Fabrication of aspherical surfaces for soft X-Ray optical elements by means of Deposition techniques

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Papers (305)：

Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe. The X-ray absorption spectroscopy analysis of the negative-Tone PAG bound resist. Proceedings of SPIE - The International Society for Optical Engineering. 2023. 12750
Yosuke Ohta, Atsushi Sekiguchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe, Hiroki Yamamoto. Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure. Journal of Photopolymer Science and Technology. 2022. 35. 1. 49-54
Tomohito Kizu, Shinji Yamakawa, Takeo Watanabe, Seiji Yasui, Tomoyuki Shibagaki. Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement. Journal of Photopolymer Science and Technology. 2022. 35. 1. 55-59
Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe. Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist. Journal of Photopolymer Science and Technology. 2022. 35. 1. 61-65
Takeo Watanabe, Tetsuo Harada, Shinji Yamakawa. R&D Activities of EUV Lithography at NewSUBARU, and Possibility of Beyond EUV. Optics InfoBase Conference Papers. 2022

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MISC (194)：

中本敦啓, 山川進二, 原田哲男, 渡邊健夫. Resonant Soft X-Ray Scattering in Reflection-mode for Spacial Evaluation in Resist Thin Film. X線分析討論会講演要旨集. 2022. 58th
原田哲男, 渡邊健夫. EUV mask observation by coherent EUV scatterometry microscope. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2021. 68th
吉田一輝, 松尾直人, 住友弘二, 部家彰, 山名一成, 原田哲男, 渡邊健夫, 田部井哲夫. Study of relationship between DNA damage by radiation and change of the characteristic of DNA transistor. 生体医歯工学共同研究拠点成果報告書. 2021. 2020
四家寛也, 黒田理人, 黒田理人, 黒田理人, 小林諒太, 村田真麻, 藤原康行, 鈴木学, 原田将真, 柴口拓, et al. A Global Shutter Wide Dynamic Range Soft X-Ray CMOS Image Sensor with 45μm-Thick Backside-Illuminated Pinned Photodiode and Two-Stage LOFIC. 映像情報メディア学会技術報告. 2021. 45. 11(IST2021 8-21)
原田哲男, 寺西信一, 寺西信一, 渡邊健夫, ZHOU Quan, BOGAERTS Jan, WANG Xinyang. 軟X線領域において量子効率90%以上の性能を有する背面照射型CMOSイメージセンサの開発. 日本放射光学会年会・放射光科学合同シンポジウム(Web). 2020. 33rd

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Patents (35)：

感光性樹脂及び感光性組成物
(7) Photosensitive Resin, and Photosensitive Composition
形状測定装置
短波長コヒーレント光源及び透過型の減光機構
感光性樹脂及び感光性組成物

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Books (27)：

CRDS 研究開発の俯瞰報告書ナノテクノロジー・材料分野
国立研究開発法人科学振興機構編 2023
フォトレジストの最先端技術
CMC出版 2022
基礎研究および産業利用を推進する放射光施設「ニュースバル」
文門科学教育通信文部科学省 2022
CRDS 研究開発の俯瞰報告書ナノテクノロジー・材料分野
国立研究開発法人科学振興機構編 2021
UV・EB硬化の最新開発動向
CMC出版 2021

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Lectures and oral presentations (882)：

EUVリソグラフィおよびレジスト・フォトマスクの概要、Beyond EUVLへの将来展望 ~目指すべき半導体業界の将来像~
(「EUVリソグラフィ」AndTech WEB講習会(オンライン) 2023)
Technical issue of EUVL, prospect for EUVL and beyond EUVL
(IEUVI Resist TWG Workshop 2023 (online))
EUVリソグラフィ技術開発の現状およびその取り巻く環境、今後の展開
(第253回フォトポリマー懇話会講演会先端・次世代リソグラフィ技術(オンライン) 2023)
EUVリソグラフィー技術開発の現状および今後の展開について
(第70回応用物理学会春季学術講演会シンポジウムマイクロ・ナノスケール微細加工の表面界面先端技術)
ニュースバルにおけるEUVL基板技術開発の現状と今後の展開
(ニュースバルシンポジウム2023 2023)

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Works (3)：

EUVリソグラフィ用レジスト材料の研究開発
1993 - 現在
EUVリソグラフィの研究
渡邊健夫 1993 - 現在
X線縮小露光評価技術の研究開発
1999 - 2001

Education (1)：

1987 - 1990 Osaka City University Physics

Professional career (1)：

Ph.D. (Osaka City University)

Work history (18)：

2023/04 - 現在兵庫県立大学学長特別補佐(先端研究担当)
2023/04 - 現在 University of Hyogo
2022/04 - 現在 University of Hyogo Executive Advisor to the President
2022/04 - 現在 University of Hyogo Laboratory of Advanced Science and Technology for Industry Executive Advisor to Director
2015/04 - 現在 University of Hyogo Center for EUVL, Laboratory of Advanced Science and Technology for Industry Director

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Committee career (37)：

2022 - 現在兵庫県「次世代電池・半導体技術開発拠点推進協議会」座長
2022 - 現在 International Conference on Photopolymer Science and Technology President
2021 - 現在一般社団法人日本半導体製造協会会員
2019/04 - 現在 Photomask Japan Conference chair
2018 - 現在 International Conference on Photomask Japan Conference Chair and Chair of the Organizing Committee

2017 - 現在 International Workshop on EUV Lithography EUVL Workshop Steering Committee

2016 - 現在 International Roadmap for Devices and Systems (IRDS) Committee Member of the Lithography Part

2014 - 現在フォトポリマー懇話会組織委員 / 企画委員

2013/01 - 現在 Program Committee

2006/04 - 現在 International Conference on Photopolymer Science and Technology International Affairs, Director

2006/04 - 現在 International Conference on Photopolymer Science and Technology Organizing Committee

2005/04 - 現在 International Conference on Photopolymer Science and Technology Program Committee

2004/04 - 現在 International Conference on Photopolymer Science and Technology Session Chair

2004/04 - 現在 International Conference on Photopolymer Science and Technology Board member

2023 - Physics of X-Ray and Neutron Multilayer Structures (PXRNMS) Organizing Committee & Program Committee Members

2016 - 2019 International Conference on Photomask Japan Co-Chair of the Organizing Committee

2013 - 第74回応用物理学会学術講演会(秋季) 座長

2013 - 第60回応用物理学関係連合講演会(春季) 講演奨励賞審査員

2012 - 第73回応用物理学会学術講演会(秋季) 座長

2012 - 第59回応用物理学関係連合講演会(春季) 座長

2007 - 2011 International Microprocesses and Nanotechnology Conference (MNC) Steering Committee Member

2007 - 2011 International Microprocesses and Nanotechnology Conference (MNC) Program Committee Co-Chair

2005 - 2011 International Microprocesses and Nanotechnology Conference (MNC) Program Committee Session Head

2002 - 2011 International Microprocesses and Nanotechnology Conference (MNC) Session Chair of EUV Lithography

2010 - 応用物理学会学術講演会(秋季 / 第71回・第72回) 座長

2009 - International Symposium on EUV Lithography Session Chair

2005 - 2008 応用物理学会プログラム編集委員

2005 - 2007 International Microprocesses and Nanotechnology Conference (MNC) Organizer of Symposium Session A

2005/04 - 2006/03 日本放射光学会企画委員

2005/04 - 2006/03 日本放射光学会組織委員

2004 - 2006 International Symposium on EUV Lithography Session Chair

2005/01 - 2005/12 The 8th International Conference on X-ray Microscope (XRM2005) Executive committee

2005 - The 8th International Conference on X-ray Microscope (XRM2005) 実行委員会

2005 - 第8回 X線結像光学シンポジウム世話人

2003/04 - 2004/03 応用物理学関係連合講演会(春季 / 第50回・第51回) 演奨励賞審査員

2004 - International Microprocesses and Nanotechnology Conference (MNC) Program Committee Session Sub-Head

2002 - 2003 International Microprocesses and Nanotechnology Conference (MNC) Program Committee Member

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Awards (6)：

2023/04 - International Conference of Photopolymer Science and Technology Outstanding Contributions A ward
2022/07 - 研究活動教員表彰最優秀賞
2016/05 - Osaka Nuclear Society Association The Award of Osaka Nuclear Society Association Resist Research and Development using SR
2013/06 - International Workshop on EUV Lithography Best Paper Award R&D of EUV Lithography
2008/06 - International Workshop on EUV Lithography Best Poster Award 1st Place EUV interference lithography employing 11-m long undulator as a light source

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Association Membership(s) (11)：

日本化学会 , 一般社団法人次世代日本半導体製造協会 , 高分子学会 , 日本放射光学会 , 日本応用物理学会 , Society of Photopolymer Science and Technology (SPST) , International Conference on Photomask Japan (PMJ) , Opitical Society of America (OSA) , The International Society for Optics and Photonics (SPIE) , Institute of Electrical and Electronics Engineers (IEEE) , 日本物理学会

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