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J-GLOBAL ID:200901055415084533   Update date: Apr. 17, 2024

Matsuoka Takashi

マツオカ タカシ | Matsuoka Takashi
Affiliation and department:
Job title: Professor
Homepage URL  (1): https://www.matsuoka-lab.niche.tohoku.ac.jp/
Research field  (5): Applied physics - general ,  Nanobioscience ,  Nanomaterials ,  Electric/electronic material engineering ,  Electronic devices and equipment
Research keywords  (10): 半導体 ,  Nitride Semiconductor ,  Wide-gap Semiconductor ,  半導体発光素子 ,  分布帰還型レーザ ,  Blue LED ,  MOVPE ,  Epitaxial Growth ,  InN ,  GaN
Research theme for competitive and other funds  (19):
  • 2016 - 2019 Crystal Growth of N-polar Nitride Semiconductor Heterostructures with Two-Dimensional Electron Gas
  • 2016 - 2019 Asymmetric-waveguide-coupled multi-striped orthogonal photo-photocarrier-propagation solar cell
  • 2016 - 2019 Study on nitrogen-polar InGaAs-channel high electron mobility transistors
  • 2016 - 2019 Control of Polarization-Induced Electric Field in Nitride-Semiconductor-Based Devices
  • 2015 - 2018 Development of GaN-based substrate for realizing highly efficient and low-cost LED
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Papers (127):
  • Takashi Matsuoka, Hitoshi Morioka, Satoshi Semboshi, Yukihiko Okada, Kazuya Yamamura, Shigeyuki Kuboya, Hiroshi Okamoto, Tsuguo Fukuda. Properties of ScAlMgO4 as Substrate for Nitride Semiconductors. Crystals. 2023. 13. 3. 449-449
  • T. Matsuoka, T. Mitate, S. Mizuno, H. Takahata, T. Tanikawa. N-Polar Gowth of Nitride Semiconductors with MOVPE and its Applications. J. Cryst. Growth. 2023. 65. 127056
  • K. Prasertsuk, T. Suemitsu, T. Matsuoka. Reverse bias annealing effects in N-polar GaN/AlGaN metal-insulator-semiconductor high electron mobility transistors. Jpn. J. Appl. Phys. 2022. 61. SA1006
  • T. M. Inerbaev, T. Matsuoka, Y. Kawazoe. Optical Band Gap Energy Values in Wurtzite InxGa1-xN. Bulletin of The University of Karaganda-Physics. 2022. 105. 107-116
  • V. Suresh Kumar, S. Y. Ji, Y. T. Zhang, K. Shojiki, J. H. Choi, T. Kimura, T. Hanada, R. Katayama, T. Matsuoka. Dependence of the V/III Ratio on Indium Incorporation in InGaN Films Grown by Metalorganic Vapour Phase Epitaxy. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY. 2020. 20. 5. 2979-2986
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MISC (15):
  • 谷川智之, 小島一信, 秩父重英, 松岡隆志. GaNの二光子励起フォトルミネッセンス測定における自己吸収の影響. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2018. 65th
  • Crystal Growth Technology of N-polar Nitride Semiconductors by Metalorganic Vapor Phase Epitaxy. 2018. 45. 1. 8p
  • MATSUOKA Takashi. 分布帰還型レーザと青色発光素子の研究開発. 電子情報通信学会エレクトロニクスソサイエティ News Letter. 2018. 168. 1. 6-8
  • T. Matsuoka, Y. Liu, T. Kimura, R. Katayama. Possibility of Pressurized-Reactor MOVPE for Nitride Semiconductors. Proceedings of LED 2011. 2011
  • MATSUOKA Takashi. 窒化物半導体の有機金属気相成長. 金属. 2009. 79. 11. 23-28
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Patents (79):
Books (8):
  • Epitaxial Growth of III-Nitride Compounds ~Computational Approach~
    Springer 2018
  • 未来をさがそう 韓国語版
    ダイヤモンド社 2007
  • 未来をさがそう
    ダイヤモンド社 2005
  • Advanced Materials in Electronics 2004
    Research Signpost 2004
  • 新編 光学材料ハンドブック
    株式会社 リアライズ社 2000
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Lectures and oral presentations  (608):
  • Progress of Compound Semiconductors for the Last Half Century ~from GaAs to GaN, and from Epitaxial Growth to Devices~
    (The 23rd RIES-Hokudai International Symposium “拓 [Taku]”)
  • N-Polar Growth of Nitride Semiconductors with MOVPE and its Applications
    (20th International Conference on Metalorganic Vapor Phase Epitaxy (ICMOVPE XX))
  • Growth and Devices of N-Polar Nitride Semiconductors
    (Advanced Materials and Semiconductor Technology Workshop 2021)
  • The Drawn to the Future of Nitride Semiconductors
    (3rd Global Conference & Expo on Materials Science and Engineering (ISTMAE-2021) 2021)
  • Evidence of carrier trapping at extrinsic gate region in N-polar GaN/AlGaN MIS HEMTs
    (13th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma) 2021)
more...
Education (2):
  • 1976 - 1978 Hokkaido University Graduate School, Division of Engineering 電子工学専攻
  • 1972 - 1976 Hokkaido University Faculty of Engineering 電子工学科
Professional career (1):
  • 工学博士 (Hokkaido University)
Work history (17):
  • 2023/04 - 現在 The Institute of Electronics, Information and Communication Engineers, Life Member
  • 2023/01 - 現在 IEEE Life Fellow
  • 2022/01 - 現在 The Japanese Association for Crystal Growth
  • 2019/04 - 現在 Tohoku University, New Industry Creation Hatchery Center (NICHe) Specially Appointed Professor
  • 2019/04 - 現在 Tohoku University Emeritus Professor
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Committee career (42):
  • 2010/01 - 現在 The Open Applied Physics Journal Associate Editor
  • 2022/10 - 科学研究費補助金S 意見書策定委員
  • 2020/11 - 2021/03 電子情報通信学会 エレクトロニクスソサイエティ賞選定委員
  • 2017/11 - 2020 イムラ・ジャパン賞 審査委員
  • 2017/12 - 2019/01 日本学術振興会 科学研究費補助金 基盤研究Sおよび新学術領域 審査委員
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Awards (30):
  • 2023/01 - IEEE IEEE Fellow Award "For Contributions to Laser Diodes for Optical Communications and Nitride Semiconductors for Light Emitting Devices",
  • 2021/04 - ISPlasma 2021/IC-PLANTS 2021 Best Presentation Award in ISPlasma 2021/IC-PLANTS 2021 "Evidence of Carrier Trapping at Extrinsic Gate Region in N-Polar GaN/AlGaN MIS HEMTs"
  • 2019/09 - Best Paper Award Three-Dimensional Imaging of Threading Dislocations in GaN Crystals using Two-Photon Excitation Photoluminescence
  • 2018/03 - 公益社団法人 応用物理学会 第8回(平成29年度)応用物理学会 化合物半導体エレクトロニクス業績賞(赤﨑勇賞) 「InGaN系混晶半導体のエピタキシャル成長技術に関する先駆的研究」
  • 2018/01 - 河北新報社 第69回(平成29年度)河北文化賞 「赤外から青色までの半導体材料とその素子応用によるエレクトロニクスの発展への貢献」
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Association Membership(s) (6):
Japanese Association for Crystal Growth ,  The international Society for Optics and Photonics (SPIE) ,  Materials Research Society (MRS) ,  The Institute of Electrical and Electronics Engineers (IEEE) ,  The Institute of Electronics, Information and Communication Engineers ,  The Japan Society of Applied Physics
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