Art
J-GLOBAL ID：200902001917501538
Reference number：85A0392014
Reactive sputtering of copper and silicon near the sputtering threshold.
スパッタリング限界付近の銅とシリコンの反応性スパッタリング
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Author (3)：
,
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Material：
Volume：
3
Issue：
4
Page：
1779-1783
Publication year：
Jul. 1985
JST Material Number：
C0789B
ISSN：
0734-2101
CODEN：
JVTAD6
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Oxide thin films
, Sputtering
Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
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