2010 - 2010 Solid phase crystallization of ZnO films via nitrogen-atom mediation
2010 - 2010 Novel Fabrication Method For Transparent Conducting Oxide Films Utilizing Solid-Phase Crystallized Seed Layers
2010 - 矢崎科学技術振興記念財団 2010(H22)年度『国際交流援助』 High quality ZnO films prepared by solid-phase crystallization of amorphous ZnON films
全件表示
論文 (294件):
Marlis Nurut Agusutrisno, Christopher H. Marrows, Kunihiro Kamataki, Takamasa Okumura, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Naoto Yamashita. On-axis sputtering fabrication of Tm3Fe5O12 film with perpendicular magnetic anisotropy. Thin Solid Films. 2024. 788. 140176-140176
Takamasa Okumura, Hayate Tanaka, Takumi Nakao, Teruki Anan, Ryo Arita, Masaki Shiraki, Kayo Shiraki, Tomoyuki Miyabe, Daisuke Yamashita, Kayo Matsuo, et al. Health assessment of rice cultivated and harvested from plasma-irradiated seeds. Scientific Reports. 2023. 13. 1
K. Koga, S. Ono, M. Eri, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, M. Shiratani. Evaluation of Interaction Between Substrate and Nanoparticles Deposited by Plasma Chemical Vapor Deposition. Bull. Am. Phys. Soc. 2023
K. Kamataki, H. Ohtomo, N. Itagaki, C. F. Lesly, D. Yamashita, T. Okumura, N. Yamashita, K. Koga, M. Shiratani. Prediction by a hybrid machine learning model for highmobility amorphous In2O3: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated amorphization method. J. Appl. Phys. 2023. 134
K. Kamataki, Y. Sasaki, I. Nagao, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani. Low-temperature fabrication of silicon nitride thin films from a SiH4+N2 gas mixture by controlling SiNx nanoparticle growth in multi-hollow remote plasma chemical vapor deposition. Mater Sci Semicond Process. 2023. 164