Rchr
J-GLOBAL ID:200901021761214506
Update date: Sep. 04, 2022
Hoshi Yoichi
ホシ ヨウイチ | Hoshi Yoichi
Homepage URL (1):
http://www.t-kougei.ac.jp/engineering/index.html
Research field (1):
Electric/electronic material engineering
Research keywords (4):
電気・電子材料工学
, 薄膜工学
, Electric and Electronic Material Engineering
, Thin film process engineering
Research theme for competitive and other funds (6):
プラスチック基板上への低抵抗透明導電膜作製技術の開発
高密度磁気記録媒体用バリウムフェライト薄膜の開発
スパンタ法による薄膜堆積過程の解明とその制御
Sputtern deposition of transparent conductive thin films on plastic substrate
Deposition of barium ferrite films for high density magnetic recording media
Control of film deposition process in sputtering
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MISC (39):
Y. Hoshi, E. Suzuki, H. Shimizu. Control of crystal orientation of Ti thin films by sputtering. Electrochimica Acta. 1999. 44. 21. 3945-3952
Y. Hoshi, R. Ohki. Low energy rf sputtering system for the deposition of ITO thin films. Electrochimica Acta. 1999. 44. 21. 3927-3932
Shimizu H., Shinozaki H., Hoshi Y., Kato K., Kaneko F. Deposition of c-Axis-Oriented Ba-Ferrite Ultra-Thin Films by the Alternate Layer Deposition Method. Journal of the Magnetics Society of Japan. 1999. 1999. 4. 1209-1212
Shimizu H., Shinozaki H., Hoshi Y., Kato K., Kaneko F. Deposition of c-Axis-Oriented Ba-Ferrite Ultra-Thin Films by the Alternate Layer Deposition Method. Journal of the Magnetics Society of Japan. 1999. 23. 4-2. 1209-1212
Crystal stracture and microstructre of nickel film deposited at liquid nitrogen temperature by sputtering. Electrochimica Acta. 1999. 44. 21/22. 3933-3944
more...
Education (4):
- 1976 Tokyo Institute of Technology Science of Engineering
- 1976 Tokyo Institute of Technology Graduate School, Division of Science and Engineering
- 1974 Niigata University Faculty of Engineering
- 1974 Niigata University Faculty of Engineering
Professional career (1):
(BLANK)
Association Membership(s) (5):
IEEE
, 電気学会
, 応用物理学会
, 電子・情報・通信学会
, 日本応用磁気学会
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