Art
J-GLOBAL ID：200902159237223218   Reference number：99A0692527

Control of crystal orientation of Ti thin films by sputtering.

スパッタリングによるTi薄膜の結晶方位の制御
Author (3)：
HOSHI Y

About HOSHI Y

(Tokyo Inst. Polytechnics, Kanagawa, JPN)

About Tokyo Inst. Polytechnics, Kanagawa, JPN

, 
SUZUKI E

About SUZUKI E

(Tokyo Inst. Polytechnics, Kanagawa, JPN)

About Tokyo Inst. Polytechnics, Kanagawa, JPN

, 
SHIMIZU H

About SHIMIZU H

(Niigata Univ., Niigata, JPN)

About Niigata Univ., Niigata, JPN


Material：
Electrochimica Acta  (Electrochim Acta)

About Electrochimica Acta


Volume： 44  Issue： 21/22  Page： 3945-3952  Publication year： 1999 
JST Material Number： B0535B  ISSN： 0013-4686  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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*Titanium

About Titanium

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Metallic thin films 
(BK14030T)

About Metallic thin films

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
スパッタリング

About スパッタリング

, 
Ti薄膜

About Ti薄膜

, 
結晶方位

About 結晶方位


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