Art
J-GLOBAL ID：200902158695638838   Reference number：99A0692525

Low energy rf sputtering system for the deposition of ITO thin films.

ITO薄膜析出に用いる低エネルギーrfスパッタリング系
Author (2)：
HOSHI Y

About HOSHI Y

(Tokyo Inst. Polytechnics, Kanagawa, JPN)

About Tokyo Inst. Polytechnics, Kanagawa, JPN

, 
OHKI R

About OHKI R

(Tokyo Inst. Polytechnics, Kanagawa, JPN)

About Tokyo Inst. Polytechnics, Kanagawa, JPN


Material：
Electrochimica Acta  (Electrochim Acta)

About Electrochimica Acta


Volume： 44  Issue： 21/22  Page： 3927-3932  Publication year： 1999 
JST Material Number： B0535B  ISSN： 0013-4686  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
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*magnetron sputtering

About magnetron sputtering

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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plasma deposition

About plasma deposition

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
ITO薄膜

About ITO薄膜

, 
析出

About 析出

, 
低エネルギー

About 低エネルギー

, 
RFスパッタリング

About RFスパッタリング


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