Art
J-GLOBAL ID:200902158695638838   Reference number:99A0692525

Low energy rf sputtering system for the deposition of ITO thin films.

ITO薄膜析出に用いる低エネルギーrfスパッタリング系
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Material:
Volume: 44  Issue: 21/22  Page: 3927-3932  Publication year: 1999 
JST Material Number: B0535B  ISSN: 0013-4686  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Oxide thin films 
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