Rchr

J-GLOBAL ID：200901072761544216 Update date: Sep. 20, 2022

Tanaka Shuji

タナカシュウジ | Tanaka Shuji

Affiliation and department：
Homepage URL (1)： http://www.fit.ac.jp/elec/lab/kita-tanalab/index.html

Research field (2)： Crystal engineering , Applied materials

Research keywords (2)：半導体工学 , Semiconductor Engineering

Research theme for competitive and other funds (2)：

シリコン中の深い不純物評価
Characterization of Deep Impurities in Semiconductors

MISC (28)：

S Tanaka, T Ikari, H Kitagawa. Distribution of substitutional nickel atoms in dislocation-free silicon studied by deep level transient spectroscopy and theoretical analyses based on the dissociative mechanism of diffusion. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 2002. 41. 11A. 6305-6309
Precipitation-Enhanced Diffution of Nickel in Dislocation-Freesilicon Studies by In-Diffusion and Annealing Processes. Physica B308-310. 2001. 308-310, PP427-430
In-Diffusion and Annealing Processes of Substitutional Nickel Atoms in Dislocation-Free Silicon(共著). Japanese Journal of Applied Physics. 2001. 40. part1. 5A,3063-3068
仙波卓弥, 田中秀司, 竹内恵三. 極微粒ダイヤモンド砥粒を用いた多層電着工具の開発(共著). 日本機械学会. 2000. 66. 643. 1057-1063
Takuya Senba, Shuji Tanaka, Keizo Takeuchi. Development of Multilayered Electroplated Diamond Tool with Fine Grains. Nihon Kikai Gakkai Ronbunshu, C Hen/Transactions of the Japan Society of Mechanical Engineers, Part C. 2000. 66. 643. 1057-1063

ｍore...

Education (4)：

- 2003 University of Miyazaki
- 2003 University of Miyazaki Graduate School, Division of Engineering
- 1975 Fukuoka Institute of Technology Faculty of Engineering
- 1975 Fukuoka Institute of Technology Faculty of Engineering

Professional career (1)：

Doctor(Engineering) (University of Miyazaki)

Association Membership(s) (2)：

電子情報通信学会 , 応用物理学会

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