Rchr
J-GLOBAL ID：200901078618263875   Update date: Sep. 28, 2022

Watanabe Yukio

ワタナベ ユキオ | Watanabe Yukio
Affiliation and department：
Former Institution / Organization Kyushu University Faculty of Information Science Electrical Engineering Department of Electronic Device Engineering

About Former Institution / Organization Kyushu University Faculty of Information Science Electrical Engineering Department of Electronic Device Engineering


Job title： Professor
Research field  (4)： Electric/electronic material engineering ,  Thin-film surfaces and interfaces ,  Basic plasma science ,  Applied plasma science
Research keywords  (6)： プラズマ理工学 ,  表面界面物性 ,  電子・電気材料工学 ,  Masma Science & Technology ,  Plasma Processing ,  Electronic and Electrical Engineering
Research theme for competitive and other funds  (14)：
  • 1995 - プラズマCVD法を用いた集積回路内銅配線形成
  • 1995 - Cu interconnects in LSI using plasma CVD method
  • 1989 - プロセスプラズマ中の微粒子生成・挙動とその応用
  • 1989 - プロセシングプラズマ中の反応制御
  • 1989 - Formation and behavior of particles in processing plasmas and their applications
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MISC (214)：
ｍore...
Books (14)：
  • Residual Stress in Cu Films Deposited by H-Assisted Plasma CVD Using Cu(EDMDD)2
    Proc. 2003 International Symposium on Dry Process 2003
  • Deposition of Nano-Cluster-Dispersed a-Si:H Films using H2+SiH4 Twin Discharges
    Proc. International Symposium on Information Science and Electrical Engineering 2003 2003
  • Conformal and Anisotropic Deposition of Cu in Trenches by using H-Assisted Plasma CVD Method
    Proc. International Symposium on Information Science and Electrical Engineering 2003 2003
  • Deposition of a-Si:H films of high stability by cluster-suppressed plasma CVD
    Proc. Int. Symp. Plasma Chemistry 2003
  • Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges
    MRS Symp. Proc. 2003
ｍore...
Works (19)：
  • LSI用低誘電率層間絶縁膜の作製技術の開発
    2002 -
  • Patent "Method for producing particles with diamond structure"
    2002 -
  • Patent"Method for producing particles with diamond structure"
    2002 -
  • 太陽電池用超高品質アモルファスSi薄膜の超高速作製のためのクラスタ抑制プラズマCVD法の開発
    1999 - 2001
  • Development of cluster-suppressed plasma CVD method for depositing extremely high-quality amorphous silicon at high rate
    1999 - 2001
ｍore...
Education (4)：
  • - 1969 Kyushu University
  • - 1969 Kyushu University Graduate School, Division of Engineering
  • - 1964 Kyushu University School of Engineering
  • - 1964 Kyushu University Faculty of Engineering
Professional career (1)：
  • Doctor of Engineering (Kyushu University)
Work history (6)：
  • 1972 - 1981 Kyushu University
  • 1972 - 1981 Kyushu University, Associate Professor
  • 1981 - - 九州大学 教授
  • 1981 - - Kyushu University, Professor
  • 1969 - 1972 Kyushu University
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Committee career (5)：
  • 2000 - 2001 米国物理学会 気体電子工学会議(GEC)実行委員
  • 1998 - 照明学会 九州支部長,本部理事
  • 1998 - 電気学会 九州支部長,本部評議員
  • 1996 - プラズマ・核融合学会 九州支部幹事
  • 1990 - 応用物理学会 九州支部理事,本部評議員,九州支部長
Association Membership(s) (5)：
米国物理学会 ,  プラズマ・核融合学会 ,  照明学会 ,  電気学会 ,  応用物理学会
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