The effect of humidity on the chemical dry etching of Si using F2 + NOx -> F + FNOx reaction
2015
Lectures and oral presentations (4)：
Effect of the oxidation-reduction potential during Ni ferrite synthesis on FeNi nanoparticles
(2019)
Modeling molecules responsible for the sidewall protection during the chemical dry etching of silicon related materials using F2 + NOx -> F + FNOx
(9th International Conference on Reactive Plasmas/68rd Gaseous Electronics Conference /33th Symposium on Plasma Processing, (ICRP-9/GEC-68/SPP-33) 2015)
Change in optical properties by texturing Si compounds by F2 and NOx gases
(Japan Society of Applied Physics (JSAP)-Optical Society of America (OSA) Joint Symposia 2015 2015)
Chemical dry etching of Si using F2 and NO2 gases at elevated temperature
(7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/8th International Conference on Plasma-Nano Technology & Science (ISPlasma2015/IC-PLANTS2015) 2015)
Education (3)：
2002 - 2006 The University of California at Berkeley Graduate School of Engineering Department of Mechanical Engineering
2001 - 2001 The University of Washington Graduate School of Engineering Materials Science and Engineering
1998 - 2001 The University of Washington Graduate School of Engineering Department of Aeronautics & Astronautics
