Rchr
J-GLOBAL ID:201501077364456709   Update date: Oct. 24, 2024

ASUBAR JOEL

アスバル ジョエル | ASUBAR JOEL
Homepage URL  (1): https://sites.google.com/view/uf-electron-device-lab/home-%E3%83%9B%E3%83%BC%E3%83%A0
Research field  (5): Electronic devices and equipment ,  Semiconductors, optical and atomic physics ,  Thin-film surfaces and interfaces ,  Crystal engineering ,  Electric/electronic material engineering
Research keywords  (8): Metal Insulator Semiconductor Structures ,  Gallium Nitride ,  MOCVD ,  AlGaN/GaN HEMTs ,  Spintronics ,  Electronic Devices ,  Heterostructures ,  MBE growth
Research theme for competitive and other funds  (7):
  • 2023 - 2026 Study on high-K dielectric/regrown nitride semiconductor interfaces for high efficiency and highly-safe transistors
  • 2023 - 2026 Gate insulator deposition process for GaN-based MOS devices using mist-CVD technique
  • 2019 - 2022 Highly Stable Normally-off GaN-based transistors via Structures and Process
  • 2019 - 2022 Surface passivation and insulated gate structures for nitride-based semiconductor devices using mist-CVD method
  • 2019 - 2022 Study on high-voltage and high-power nitrided-based transistor amplifiers operated at quasi-millimeter wave frequencies
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Papers (107):
  • Keigo Bito, Masaki Ishiguro, Hadirah A Radzuan, Hikaru Hiroshige, Tomohiro Motoyama, Yusui Nakamura, Joel T Asubar, Zenji Yatabe. Interface state density in mist chemical vapor deposited Al2O3/AlGaN/GaN structure. Japanese Journal of Applied Physics. 2024. 63. 080905-1
  • Toi Nezu, Shogo Maeda, Ali Baratov, Suguru Terai, Kishi Sekiyama, Itsuki Nagase, Masaaki Kuzuhara, Akio Yamamoto, Joel T. Asubar. Effect of Ultra-Thin AlGaN Regrown Layer on the Electrical Properties of ZrO2/AlGaN/GaN Structures. Phys. Status Solidi A. 2024
  • Shogo Maeda, Shinsaku Kawabata, Itsuki Nagase, Ali Baratov, Masaki Ishiguro, Toi Nezu, Takahiro Igarashi, Kishi Sekiyama, Keito Shinohara, Melvin John, et al. Improved Performance of Normally-off GaN-based MIS-HEMTs with Recessed-gate and Ultrathin Regrown AlGaN Barrier. Journal of Semiconductor Technology and Science. 2024. 24. 1. 25-32
  • Akio Yamamoto, Ali Baratov, Masaaki Kuzuhara, Joel T Asubar. MOVPE growth of AlGaN on RIE-treated GaN surfaces and its application to AlGaN/GaN electron devices. 2023 IEEE IMFEDK Tech. Dig. 2023. 2023
  • T Igarashi, S Maeda, A Baratov, JT Asubar, M Kuzuhara. AlGaN/GaN Schottky-Gate HEMTs with low thermal budget V/Al/Mo/Au ohmic contacts. 2023 IEEE IMFEDK Tech. Dig. 2023. 2023
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Books (2):
  • MBE-grown ZnSnAs2 Epitaxial Films: A Ferromagnetic Semiconductor Host Prospect (invited book chapter), “Chalcopyrite: Chemical Composition, Occurrence and Uses”
    Nova Science Publishers, Inc., (Hauppauge) New York 2014
  • Electronics Engineering Reviewer For Today’s ECE Licensure Examination
    Padilla Engineering and Review Center Publishing and Tutorial Center 2001
Lectures and oral presentations  (202):
  • High Field Effect Mobility in Normally-Off O2 plasma-treated GaN-based MIS-HEMTs with relatively thick AlGaN barrier layer
    (11th Asia-Pacific Workshop on Widegap Semiconductor (APWS 2024) 2024)
  • High Performance Normally-off GaN-based HEMTs achieved with Recessed and Regrown Channel Structures
    (11th Asia-Pacific Workshop on Widegap Semiconductor (APWS 2024) 2024)
  • Breaking the trade-off of drain current and threshold voltage in Normally-off GaN-based MIS-HEMTs by state-of-the-art regrowth technology
    (第7回有機・無機エレクトロニクスシンポジウム 2024)
  • Realization of low ohmic contact resistance in AlGaN/GaN HEMTs using V/Al/Mo/Au metal stack
    (7th Organic and Inorganic Electronics Symposium: O&I Symposium 2024)
  • Improving the stability of AlGaN/GaN MIS-HEMTs using ZrO2/Al2O3 multilayer nano-laminate insulators) Suguru Terai, Kishi Sekiyama, Takahiro Igarashi, Rei Kato, Reaz Tanvir Ahmed, Masaaki Kuzuhara, Joel T. Asubar
    (7th Organic and Inorganic Electronics Symposium: O&I Symposium 2024)
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Education (4):
  • 2006 - 2009 Nagaoka University of Technology Electrical Engineering PhD in Information Science and Control Engineering
  • 2004 - 2006 Nagaoka University of Technology Electrical Engineering Masters in Electrical, Electronics and Information Engineering
  • 1996 - 1998 Mapua Institute of Technology EE-ECE-CoE Masters in Engineering Major in Electronics
  • 1991 - 1995 Mapua Institute of Technology EE-ECE-CoE BS in Electronics and Communications Engineering
Professional career (1):
  • PhD in Information Science and Control Engineering (Nagaoka University of Technology)
Work history (4):
  • 2019/04 - 現在 University of Fukui Graduate School of Engineering Associate Professor
  • 2014/11 - 2019/03 University of Fukui Tenure-Track Program for Innovative Research Senior Assistant Professor
  • 2010/04 - 2014/10 Hokkaido University Research Center for Integrated Quantum Electronics Post-doctoral Fellow
  • 2009/11 - 2010/03 Nagaoka University of Technology Department of Electrical Engineering Post-doctoral Fellow
Committee career (18):
  • 2023 - 現在 Japanese Society of Applied Physics JJAP/APEX Editor
  • 2023 - 現在 SSDM (International Conference on Solid State Devices and Materials) Committee Vice-chair (Area4: Power/High-speed Devices and Materials)
  • 2022 - 現在 SSDM (International Conference on Solid State Devices and Materials) Committee member (Area4: Power/High-speed Devices and Materials)
  • 2020/04 - 現在 IEEE Electron Devices Society Kansai Chapter Academia Committee Vice Chair
  • 2020 - 現在 The 2021 International Meeting for Future of Electron Devices, Kansai Program Committee Chair
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Awards (22):
  • 2024/10 - Asia-Pacific Workshop on Widegap Semiconductors (APWS 2024) Best Poster Awards High Field Effect Mobility in Normally-Off O2 plasma-treated GaN-based MIS-HEMTs with relatively thick AlGaN barrier layer
  • 2023/11 - 14th international Conference on Nitride Semiconductors (ICNS 14) Outstanding Poster Award Effect of ultra-thin AlGaN regrown layer on the electrical properties of ZrO2/AlGaN/GaN structures
  • 2023/09 - Institute of Physics (IOP) Trusted Reviewer Status Award IOP Trusted Reviewer Status Award
  • 2022/04 - Institute of Physics (IOP) Applied Physics Express Outstanding Reviewer Award
  • 2021/12 - American Institute of Physics Most Read Tutorials and Methods from 2021, Journal of Applied Physics Controlling surface/interface states in GaN-based transistors: Surface model, insulated gate, and surface passivation
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Association Membership(s) (1):
THE JAPAN SOCIETY OF APPLIED PHYSICS
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