Rchr
J-GLOBAL ID：201701012292442377
Update date: Sep. 30, 2022
Okamoto Hiroshi
オカモト ヒロシ | Okamoto Hiroshi
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Other affiliations (2)：
自然科学系 機能創成科学領域
教授
理工学部
電子情報工学科 教授
Homepage URL (1)：
http://www.eit.hirosaki-u.ac.jp/~okamoto/home/
Research field (2)：
Crystal engineering
, Electric/electronic material engineering
Research keywords (9)：
DLTS
, surfactant
, bismuth
, quantum dot
, MIS
, GeSn
, Ge
, germanium
, semiconductor nano structure
Papers (84)：
Keiichi Nakata, Hideki Nakazawa, Hiroshi Okamoto, Yasuyuki Kobayashi. Influence of the terrace width of pentacene underlayers on the crystallinity of C60 overlayers. Thin Solid Films. 2019. 692. 137638_1-137638_5
Hiroshi Okamoto, Kensuke Takita, Kazuto Tsushima, Takehiko Tawara, Kouta Tateno, Guoqiang Zhang, Hideki Gotoh. Low-temperature formation of GeSn nanodots by Sn mediation. Jpn. J. Appl. Phys. 2019. 58. SDDG09_1-SDDG09_8
Kazuto Tsushima, Kensuke Takita, Hideki Nakazawa, Takehiko Tawara, Kouta Tateno, Guoqiang Zhang, Hideki Gotoh, Hiroshi Okamoto. Study on the formation mechanism of bismuth-mediated Ge nanodots fabricated by vacuum evaporation. Jpn. J. Appl. Phys. 2019. 58. SDDG10_1-SDDG10_5
Hiroshi Okamoto. Self-Organized Nanostructure Formation of III-V and IV Semiconductors with Bismuth. Journal of Advances in Nanomaterials. 2016. 1. 82-94
Yukio Fukuda, Daichi Yamada, Tomoya Yokohira, Kosei Yanachi, Chiaya Yamamoto, Byeonghak Yoo, Junji, Yamanaka, Tetsuya Sato, Toshiyuki Takamatsu, et al. Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition. Journal of Vacuum Science & Technology A. 2016. 34. 2. 02D101_1-02D101_4
ｍore...
Education (1)：
1981 - 1983 千葉大学大学院 工学研究科
Professional career (1)：
博士(工学) (千葉大学)
Work history (2)：
2008/04 - 現在 Hirosaki University Graduate School of Science and Technology Professor
1983/04 - 2008/03 NTT(旧電電公社含む) 電気通信研究所(NEL社への出向を含む)
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