Art
J-GLOBAL ID:201602280578969658   Reference number:16A0388427

Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition

ラジカル増強原子層蒸着によるゲルマニウム基板上のゲルマニウム酸アルミニウムの形成における低エネルギーイオン照射の役割
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Volume: 34  Issue:Page: 02D101-02D101-4  Publication year: Mar. 2016 
JST Material Number: C0789B  ISSN: 0734-2101  CODEN: JVTAD6  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Oxide thin films 

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