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J-GLOBAL ID：201801020132901910   Update date: Oct. 31, 2024

Tsutsumi Takayoshi

ツツミ タカヨシ | Tsutsumi Takayoshi
Affiliation and department：
Nagoya University Center for Low-temperature Plasma Sciences (cLPS)

About Nagoya University Center for Low-temperature Plasma Sciences (cLPS)


Job title： Associate professor
Research field  (1)： Applied plasma science
Research theme for competitive and other funds  (4)：
  • 2023 - 2026 グリーンプラズマエッチングに向けた高アスペクト比孔内の活性種輸送特性の実験的解明
  • 2021 - 2024 Innovation in atomically controlled engineering of plasma etching technology with builiding a collaborative environment for theory, computation, and measurement
  • 2020 - 2023 Elucidation of plasma-induced defect generation mechanism during atomic layer etching
  • 2018 - 2021 高移動度InNチャネルに向けた高密度ラジカル照射下における初期成長機構の解明
Papers (78)：
  • Nunomura, S, Tsutsumi, T, Takada, N, Fukasawa, M, Hori, M. Radical, ion, and photon's effects on defect generation at SiO2/Si interface during plasma etching. APPLIED SURFACE SCIENCE. 2024. 672
  • Yoshihiro Sakamoto, Takayoshi Tsutsumi, Hiromasa Tanaka, Kenji Ishikawa, Hiroshi Hashizume, Masaru Hori. High-Speed Removal Process for Organic Polymers by Non-Thermal Atmospheric-Pressure Spark Discharge at Room Temperature and Its Mechanism. Coatings. 2024
  • Tsutsumi Takayoshi. Pseudo-Wet Plasma Mechanism Enabling High-Throughput Dry Etching of SiO2 by Cryogenic-Assisted Surface Reactions. Small Methods. 2024
  • Takayoshi Tsutsumi, Atsuki Asano, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori. In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching. Journal of Vacuum Science & Technology A. 2024. 42. 3
  • S. Nunomura, T. Tsutsumi, I. Sakata, M. Hori. O2 and Ar plasma processing over SiO2/Si stack: Effects of processing gas on interface defect generation and recovery. journal of Applied Physics. 2024. 135. 5. 053301
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MISC (6)：
  • 近藤博基, 堤隆嘉, 石川健治, 堀勝, 平松美根男. 液中プラズマによるナノグラフェンの高速合成と機能化. 表面と真空. 2024. 67. 2. 77-82
  • 堤 隆嘉. ドライエッチングと原子層エッチングの基礎と応用. 第34回 プラズマエレクトロニクス講習会~プラズマプロセスの基礎と先端応用技術~. 2023. 45-59
  • 堤 隆嘉, 石川 健治, 近藤 博基, 関根 誠, 堀 勝. 窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス. プラズマ・核融合学会誌. 2021. 97. 9. 517-521
  • 近藤博基, 堤隆嘉, 石川健治, 関根 誠, 堀 勝. 大気圧プラズマ処理による異種材料接合. 化学工学(公益社団法人 化学工学会). 2018. 82. 9. 487-490
  • 堤 隆嘉. 高速かつ高精度非接触, リアルタイム基板温度計測システムの開発~超微細加工プラズマプロセスのイノベーションに向けて~. プラズマエレクトロニクス分科会会報. 2013. 58. 19
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Patents (9)：
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Lectures and oral presentations  (333)：
  • パルスプラズマにおける負イオンエネルギー分布の時間 分解測定
    (第71回応用物理学会春期学術講演会 2024)
  • カーボンハードマスクの膜特性に対する基板バイアス寄 与度の局所的顕在化
    (第71回応用物理学会春期学術講演会 2024)
  • プラズマ誘起欠陥の発生と修復~RIE-SiO2に伴うSiO2 / Si界面の欠陥評価~
    (第71回応用物理学会春期学術講演会 2024)
  • In-situ analysis of chemisorption reactions on SiO2 surface using carbon precursor containing halogen
    (ISPlasma2024/IC-PLANTS2024/APSPT-13 2024)
  • Prediction Model for RF Bias Effect on Etch Resistance of Amorphous Carbon in Plasma Enhanced Chemical Vapor Deposition
    (ISPlasma2024/IC-PLANTS2024/APSPT-13 2024)
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Education (1)：
  • 2012 - 2015 Nagoya University Graduate School, Division of Engineering
Professional career (1)：
  • 博士(工学) (名古屋大学)
Work history (6)：
  • 2024/04 - 現在 Nagoya University Associate professor
  • 2023/04 - 2024/03 Nagoya University Lecturer
  • 2019/04 - 2023/03 Nagoya University Center for Low-temperature Plasma Sciences (cLPS) Assistant Professor
  • 2017/05 - 2023/03 Nagoya University Graduate School of Engineering Electronics 2 Assistant Professor
  • 2017/09 - 2019/03 Nagoya University Graduate School of Engineering Plasma Nanotechnology Research Center Assistant Professor
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Committee career (5)：
  • 2017/04 - 現在 ISPlasma / IC-PLANTS 実行委員会 実行委員
  • 2023/02 - 2023/11 AAPPS-DPP2023 実行委員
  • 2022/03 - 2023/11 44th DPS2023 実行委員会 実行委員
  • 2022/08 - 2023/09 2023年国際固体素子・材料コンファレンス実行委員会 実行委員
  • 2021 - 2022 IUMRS-ICYRAM 組織委員
Awards (7)：
  • 2023/03 - 15th anniversary International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlsma2023) / 16th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2023) The Best Oral Presentation Awards In-Plane Aligned Growth of Carbon Nanowalls by Ion Irradiation Control
  • 2021/03 - 13th anniversary International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlsma2021) / 14th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2021) The Best Oral Presentation Awards Design of Removal Process of SnO2 on Glass by H2/Ar Plasma at Atmospheric Pressure and Medium Pressure
  • 2021/03 - 13th anniversary International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlsma2021) / 14th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2021) The Best Short Presentation Awards Study of Etching Process Using Gas Condensed Layer at Cryogenic Temperature 2
  • 2019/03 - 11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlsma2019) / 12th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2019) The Best Oral Presentation Awards Control of sp2-C Fraction and Hardness of Amorphous Carbon Films by Formation of Precursor Radicals Depending on a Residence Time
  • 2018/10 - 株式会社 堀場製作所 堀場雅夫賞
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Association Membership(s) (2)：
プラズマ核融合学会 ,  応用物理学会
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