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J-GLOBAL ID：202001019288192838 Update date: Nov. 21, 2024

Moto Kenta

モトウケンタ | Moto Kenta

Affiliation and department：
Research theme for competitive and other funds (5)：

Papers (35)：

Linyu Huang, Kenta Moto, Kota Igura, Takamitsu Ishiyama, Kaoru Toko, Dong Wang, Keisuke Yamamoto. Low-temperature process design for inversion mode n-channel thin-film-transistor on polycrystalline Ge formed by solid-phase crystallization. Japanese Journal of Applied Physics. 2024. 63. 2. 02SP42
Kenta Moto, Kaoru Toko, Tomonari Takayama, Toshifumi Imajo, Takamitsu Ishiyama, and Keisuke Yamamoto. Rectifying Schottky Contact in ZrN/polycrystalline p-Ge. IEEE Journal of the Electron Devices Society. 2023. 11. 553-558
Takaya Nagano, Ryutaro Hara, Kenta Moto, Keisuke Yamamoto, Taizoh Sadoh. Improved carrier mobility of Sn-doped Ge thin films (≤20 nm) on insulator by interface-modulated solid-phase crystallization combined with surface passivation. Materials Science in Semiconductor Processing. 2023. 165
Takuto Mizoguchi, Takamitsu Ishiyama, Kenta Moto, Toshifumi Imajo, Takashi Suemasu, Kaoru Toko. Solid-Phase Crystallization of GeSn Thin Films on GeO2-Coated Glass. PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS. 2022
Kenta Moto, Keisuke Yamamoto, Toshifumi Imajo, Takashi Suemasu, Hiroshi Nakashima, Kaoru Toko. Sn Concentration Effects on Polycrystalline GeSn Thin Film Transistors. IEEE Electron Device Letters. 2021. 42. 12. 1735-1738

MISC (9)：

草野欽太, 工藤和樹, 塘内功大, 坂口大成, 茂藤健太, 本山慎一, 楠田豊, 古田真浩, 中庸行, 沼田朋子, et al. 非熱的エネルギーを用いた非晶質Ge/SiO2の低温固相成長 (シリコン材料・デバイス). 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報. 2016. 116. 1. 31-34
MOTO Kenta, SAKIYAMA Shin, SAKAI Takatsugu, NAKASHIMA Kazutoshi, OKAMOTO Hayato, TAKAKURA Kenichiro, TSUNODA Isao. Influence of electron irradiation on Au-induced crystallization for amorphous Ge/SiO_2-substrate. Technical report of IEICE. SDM. 2014. 114. 1. 21-25
茂藤健太, 岡本隼人, 崎山晋, 原英之, 西村浩人, 高倉健一郎, 角田功. 絶縁膜上における非晶質Ge薄膜の【電子線+金属触媒】誘起成長. 応用物理学会九州支部学術講演会講演予稿集(Web). 2014. 40
茂藤健太, 崎山晋, 岡本隼人, 酒井崇嗣, 中嶋一敬, 原英之, 西村浩人, 高倉健一郎, 角田功. 非晶質Ge/SiO₂のAu誘起横方向成長に及ぼす電子線照射効果. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2014. 75th
酒井崇嗣, 中嶋一敬, 茂藤健太, 本山慎一, 楠田豊, 古田真浩, 中庸行, 沼田朋子, 高倉健一郎, 角田功. 非晶質Ge/SiO₂のAu誘起横方向成長に及ぼす応力印加効果. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2014. 75th

Professional career (1)：

Committee career (1)：

2022/01 - 現在 International Conference on Solid State Device and Materials (SSDM) Program Committee Member (Area 10)

Awards (8)：

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