Rchr
J-GLOBAL ID:200901004223661630   Update date: Jun. 08, 2020

Watanabe Takeo

ワタナベ タケオ | Watanabe Takeo
Affiliation and department:
Homepage URL  (1): http://www.lasti.u-hyogo.ac.jp
Research field  (2): Electronic devices and equipment ,  Optical engineering and photonics
Research keywords  (2): Electronic device・Instrumentation engineering ,  Applied optics・quantum optical enginnering
Research theme for competitive and other funds  (3):
  • Multilayer reflectivity measurement
  • Decomposition reaction of organic material by SR irradiation
  • Study on Extreme Ultra Violet Lithography
Papers (204):
  • Seiji Takahashi, Hiroko Minami, Yoko Matsumoto, Yoichi Minami, Mikio Kadoi, Atsushi Sekiguchi, Takeo Watanabe. In-Situ Measurement of Outgassing Generated from EUV Metal Oxide Nanoparticles Resist During Electron Irradiation. J. Photopolym. Sci. Technol. 2018. 31. 257-260
  • Hiroto Kudo, Shizuya Ohori, Hiroya Takeda, Hiroki Ogawa, Takeo Watanabe, Hiroki Yamamoto, Takahiro Kozawa. Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Lithography System. J. Photopolym. Sci. Technol. 2018. 31. 221-225
  • Mana Yoshifuji, Shota Niihara, Tetsuo Harada, Takeo Watanabe. Fabrication of High-Aspect-Ratio Transmission Grating Using DDR Process for 10-nm EUV Resist Evaluation by EUV Interference Lithography. J. Photopolym. Sci. Technol.,. 2018. 31. 215-220
  • Hiroto Kudo, Mari Fukunaga, Kohei Shiotsuki, Hiroya Takeda, Hiroki Yamamoto, Takahiro Kozawa, Takeo Watanabe. Synthesis of Hyperbranched Polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene; Resist Properties for Extreme Ultraviolet (EUV) Lithography,. Reactive and Functional Polymers. 2018
  • Mari Fukunaga, Hiroki Yamamoto, Takahiro Kozawa, Takeo Watanabe, Hiroto Kudo. Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material. JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY. 2017. 30. 1. 103-107
more...
MISC (61):
Patents (5):
  • (7) Photosensitive Resin, and Photosensitive Composition
  • (2) Photoresist polymer having nanosmoothness and etching ressistance and resist composition
  • (4) Electron Beam or EUV (Extreme Ultraviolet) Resist Composition and Process for the Formation of Resist
  • (1) Resist Patterns and Method of Forming Resist Patterns
  • Resist Patterns and Method of Forming Resist Patterns(United States Patent)
Lectures and oral presentations  (174):
  • Research activity of evaluation tools including soft X-ray optics for the research of EUV lithography at University of Hyogo
    (Physics of X-ray and Neutron Multilayer Structures (PXRNMS2018) 2018)
  • Rsearch Activities of Extreme Ultraviolet Lithography at University of Hyogo
    (Micro Nano Engineering 2018 2018)
  • Photopolymer Technology for Extreme Ultraviolet Lithography
    (Polymer World Congress 2018 2018)
  • Toward the Analysis of the Origin of Stochastic
    (Panel Symposium in English: “EUV Resist Sensitization and Roughness Improvement: Can We Get Both?”, The 35th International Conference of Photopolymer Science and Technology 2018)
  • (171) In-Situ Measurement of Outgassing Generated from EUV Metal Oxide Nanoparticles Resist During Electron Irradiation
    (The 35th International Conference of Photopolymer Science and Technology 2018)
more...
Professional career (1):
  • Ph.D. (Osaka City University)
Work history (12):
  • 2016/04 - 現在 University of Hyogo Director
  • 2015/04 - 現在 University of Hyogo Professor
  • 2008/04 - 2014/03 University of Hyogo Associate Professor
  • 2007/04 - 2008/03 University of Hyogo Assistant professor
  • 2004/04 - 2007/03 University of Hyogo Research Associate
Show all
Committee career (6):
  • 2013/01 - 現在 International Conference on Electron Ion Photon Beam Technology and Nanofabrication Program Committee
  • 2006/04 - 現在 International Conference on Photopolymer Science and Technology Organizing Committee
  • 2005/04 - 現在 International Conference on Photopolymer Science and Technology Program Committee
  • 2004/04 - 現在 International Conference on Photopolymer Science and Technology Session Chair
  • 2002/04 - 2008/03 International Microprocesses and Nanotechnology Conference (MNC) Program Committee Member
Show all
Awards (4):
  • 2016/05 - Osaka Nuclear Society Association The Award of Osaka Nuclear Society Association Resist Research and Development using SR
  • 2013/06 - International Workshop on EUV Lithography Best Paper Award R&D of EUV Lithography
  • 2008/06 - International Workshop on EUV Lithography Best Poster Award 1st Place EUV interference lithography employing 11-m long undulator as a light source
  • 2002/03 - The Physical Society of Japan The 7th Outstanding Paper Award of the Physical Society of Japan Direct Observation of Sequential Weak Decay of a Double Hypernucleus
Association Membership(s) (2):
SPIE ,  IEEE
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