Rchr
J-GLOBAL ID:200901021761214506   Update date: Aug. 27, 2020

Hoshi Yoichi

ホシ ヨウイチ | Hoshi Yoichi
Affiliation and department:
Homepage URL  (1): http://www.t-kougei.ac.jp/engineering/index.html
Research field  (1): Electric/electronic material engineering
Research keywords  (4): 電気・電子材料工学 ,  薄膜工学 ,  Electric and Electronic Material Engineering ,  Thin film process engineering
Research theme for competitive and other funds  (6):
  • プラスチック基板上への低抵抗透明導電膜作製技術の開発
  • 高密度磁気記録媒体用バリウムフェライト薄膜の開発
  • スパンタ法による薄膜堆積過程の解明とその制御
  • Sputtern deposition of transparent conductive thin films on plastic substrate
  • Deposition of barium ferrite films for high density magnetic recording media
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MISC (39):
Education (4):
  • - 1976 Tokyo Institute of Technology
  • - 1976 Tokyo Institute of Technology
  • - 1974 Niigata University
  • - 1974 Niigata University
Professional career (1):
  • (BLANK)
Association Membership(s) (5):
IEEE ,  電気学会 ,  応用物理学会 ,  電子・情報・通信学会 ,  日本応用磁気学会
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