Saito Takeyasu

サイトウタケヤス | Saito Takeyasu

Affiliation and department：
Homepage URL (1)： http://www.chemeng.osakafu-u.ac.jp/group6/index.html

Research field (5)： Chemical reaction and process system engineering , Inorganic materials , Electric/electronic material engineering , Thin-film surfaces and interfaces , Electronic devices and equipment

Research keywords (1)：半導体プロセス工学半導体デバイス化学気相合成化学反応速度論半導体材料工学

Research theme for competitive and other funds (11)：

2021 - 2024 Analysis of physicochemical behavior between metal particles and cells in culture medium and development of sustained-release control method
2018 - 2021 Preparation of high-performance capacitors with thermosetting resin-derived activated carbon modified with supercritical carbon dioxide
2015 - 2019 Role of Monovalent Copper Ion in Embedding Copper Damascene Wiring Pore
2015 - 2018 Low temperature synthesis of FeN nanoparticles with supercritical carbon dioxide
2013 - 2017 Assembly of polyhedral metal oxide nanocrystal to facilitate handling of nanomaterials

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Papers (76)：

Natsuki Narumoto, Naoki Okamoto, Takeyasu Saito. Surface structure control and charge/discharge characteristics of bismuth anode materials by electrodeposition for magnesium-ion batteries. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS. 2021
Atsushi Kobayashi, Shinya Ohmagari, Hitoshi Umezawa, Daisuke Takeuchi, Takeyasu Saito. Suppression of killer defects in diamond vertical-type Schottky barrier diodes (vol 59, SGGD10, 2020). JAPANESE JOURNAL OF APPLIED PHYSICS. 2020. 59. 8
Atsushi Kobayashi, Shinya Ohmagari, Hitoshi Umezawa, Daisuke Takeuchi, Takeyasu Saito. Suppression of killer defects in diamond vertical-type Schottky barrier diodes. JAPANESE JOURNAL OF APPLIED PHYSICS. 2020. 59
Kanade Hokari, Shinichiro Suzuki, Naoki Okamoto, Takeyasu Saito, Isamu Ide, Masanobu Nishikawa, Yoshikazu Onishi. Structural Analysis of Furfural Resin-based Active Carbon to Control an Electric Double-layer Capacitor. ELECTROCHEMISTRY. 2020. 88. 3. 127-131
Takeyasu Saito, Kaname Izumi, Yuichiro Hirota, Naoki Okamoro, Kazuo Kondo, Takeshi Yoshimura, Norifumi Fujimura. Amorphous Carbon Film Deposition for Hydrogen Barrier in FeRAM Integration by Radio Frequency Plasma Chemical Vapor Deposition Method. ECS Transactions. 2019. 25. 8. 693-698

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MISC (2)：

Education (2)：

- 1995 The University of Tokyo
- 1991 The University of Tokyo The Faculty of Engineering

Professional career (1)：

博士(工学) (東京大学)

Association Membership(s) (6)：

Electrochemical Society , Materials Research Society , 表面技術協会 , エレクトロニクス実装学会 , 化学工学会 , 応用物理学会

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