Art
J-GLOBAL ID：200902259511610023   Reference number：04A0849210

New etching process for device fabrication using diamond

ダイヤモンドを用いたデバイス作製のための新しいエッチングプロセス
Author (3)：
HWANG D S

About HWANG D S

(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)

About National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN

, 
SAITO T

About SAITO T

(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)

About National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN

, 
FUJIMORI N

About FUJIMORI N

(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)

About National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN


Material：
Diamond and Related Materials  (Diam Relat Mater)

About Diamond and Related Materials


Volume： 13  Issue： 11/12  Page： 2207-2210  Publication year： Nov. 2004 
JST Material Number： W0498A  ISSN： 0925-9635  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
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*plasma etching

About plasma etching

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
ダイヤモンド

About ダイヤモンド

, 
作製

About 作製

, 
エッチングプロセス

About エッチングプロセス


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