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J-GLOBAL ID：200901047189985686   Update date: Jan. 31, 2024

Nagayama Katsuhisa

ナガヤマ カツヒサ | Nagayama Katsuhisa
Affiliation and department：
Shibaura Institute of Technology Department of Materials Science and Engineering, College of Engineering

About Shibaura Institute of Technology Department of Materials Science and Engineering, College of Engineering


Homepage URL  (1)： http://www.shibaura-it.ac.jp/
Research field  (1)： Structural and functional materials
Research theme for competitive and other funds  (19)：
  • 2017 - 2020 Single crystal semiconductor and nitride and ferromagnetic silicide new device using cotainerless process
  • 2012 - 2015 Creation of the high efficiency solar cell spherical Si and III-V type compound semiconductor new device by using drop tube process
  • 2004 - 2007 ガスジェット浮遊型電磁浮遊炉を用いた半導体Siの結晶成長カイネティクス
  • 2004 - 2007 Crystal growth of semiconductor Si by using gas jet type elictromagnetic levitation furnace.
  • 2003 - 2006 Containerless Process for the Spherical Single Crystal Semiconductor Silicon by the Gas Jet Flow Type Electromagnetic Levitation.
Show all
Papers (11)：
ｍore...
MISC (154)：
ｍore...
Patents (2)：
  • Nd-Fe-B系浮遊溶融試料の高速圧縮法を用いた高性能永久磁石創製
  • 自由落下部3mのショートドロップチューブを用いた次世代高効率太陽電池用球状単結晶Si生成
Books (2)：
  • ADVANCED MATERIALS ’93 I/B:MAGRETIC,FULLUERENCE,DIELECTRIC,FWRROELECTRIC,DIAMOND AND RELATED MATERIALS.(共著)
    1994
  • ADVANCED MATERIALS ’93 I/B:MAGRETIC,FULLUERENCE,DIELECTRIC,FWRROELECTRIC,DIAMOND AND RELATED MATERIALS.
    1994
Works (2)：
  • 無容器プロセスによる過冷凝固、結晶成長と熱物性値に関する研究(-電磁浮遊法による強磁性材料の無容器凝固プロセスの検討-)
    2001 - 2004
  • Nd-Fe-B系異方性高性能磁石材料の開発(-無容器プロセスを用いたNd-Fe-B系異方性磁石材料の過冷凝固過程と高機能化の検討-)
    2001 - 2002
Education (4)：
  • - 1984 Shibaura Institute of Technology
  • - 1984 Shibaura Institute of Technology Graduate School, Division of Engineering
  • - 1982 Shibaura Institute of Technology
  • - 1982 Shibaura Institute of Technology
Professional career (2)：
  • 工学博士 (東京大学)
  • 工学修士 (芝浦工業大学)
Awards (1)：
  • 1991 - 日本金属学会論文賞受賞
Association Membership(s) (4)：
軽金属学会 ,  日本金属学会 ,  日本応用磁気学会 ,  日本マイクログラビティ応用学会
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