Rchr
J-GLOBAL ID:200901059053384040
Update date: Sep. 18, 2024
Kakiuchi Takuhiro
カキウチ タクヒロ | Kakiuchi Takuhiro
Affiliation and department:
Job title:
Associate Professor
Research field (4):
Quantum beam science
, Basic physical chemistry
, Semiconductors, optical and atomic physics
, Electronic devices and equipment
Research keywords (9):
Surface and Interface
, Surface Physical Properties
, Quantum chemistry
, Physical properties of semiconductor surfaces
, Structure Chemistry
, Auger-electron spectroscopy
, X-ray photoelectron spectroscopy
, Coincidence spectroscopy
, Surface Science
Research theme for competitive and other funds (14):
- 2021 - 2024 金属(Hf・Zr)/Si半導体表面界面局所構造中シリサイドの酸化反応理解と制御
- 2017 - 2020 凹凸あるSi表面でのhigh-k材料超薄膜の成長過程とその低次元物性発現の観測
- 2018 - 2018 Si(110)単結晶上に作製した二酸化ハフニウム超薄膜の表面界面を選 別した局所価電子状態の同時観測
- 2017 - 2018 固体表面研究用角度分解同時計数装置の開発による単原子分光研究
- 2016 - 2017 リアルタイムX線光電子分光法によるシリコン(Si)単結晶上に作製したハフニウム(Hf)超薄膜の酸化過程の観測
- 2014 - 2016 不活性Si(110)表面の1次元構造を利用した高誘電体超薄膜作製と薄膜物性評価
- 2012 - 2015 分子/半導体表面の個々の原子サイトを選別した局所電子状態、電子励起ダイナミク ス
- 2013 - 2014 Si(110)表面の1次元列を利用したマルチプルゲートスタック構造の開発に向けて
- 2013 - 2014 Si(110)表面の1次元鎖をチャンネルワイヤーとしたマルチプルゲートスタック構造の創製
- 2013 - 2014 メタルシリサイド超薄膜の埋もれた表面界面準位の選択的かつ定量的観測
- 2011 - 2013 金属・金属酸化物高誘電体超薄膜の表面界面近傍に特異な局所価電子状態の定量的観測
- 2010 - 2012 高誘電体ゲート絶縁膜の表面界面局所価電子状態の研究
- 2008 - 2011 小規模実験室専用コインシデンス分光装置の開発による気体分子の内殻電子励起ダイナミクスの研究
- 2008 - 2010 気体および固体の内殻電子励起ダイナミクスの研究が可能な電子銃を用いた実験室用コインシデンス分光装置の開発
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Papers (31):
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Takuhiro Kakiuchi, Ryota Anai, Taiju Saiki, Yasutaka Tsuda, Akitaka Yoshigoe. Coverage Dependence upon Early Oxidation Stages of Hafnium-Adsorbed Si(111)-7 × 7. The Journal of Physical Chemistry C. 2024. 128. 13052-13063
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Takuhiro Kakiuchi, Tomoki Matoba, Daisuke Koyama, Yuki Yamamoto, Akitaka Yoshigoe. Oxidation Mechanisms of Hafnium Overlayers Deposited on a Si(111) Substrate. Langmuir. 2022. 38. 8. 2642-2650
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T. Kakiuchi, T. Matoba, D. Koyama, Y. Yamamoto, D. Katoh, A. Yoshigoe. Precise chemical state analyses of ultrathin hafnium films deposited on clean Si(111)-7 x 7 surface using high-resolution core-level photoelectron spectroscopy. Surface Science. 2020. 701. 121691-1-121691-8
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KAKIUCHI Takuhiro, YAMASAKI Hideki, TSUKADA Chie, YOSHIGOE Akitaka. Initial oxidation processes of ultrathin hafnium film and hafnium disilicide islands on Si(100)-2 x 1 surfaces studied using core-level X-ray photoelectron spectroscopy. Surface Science. 2020. 693. 121551-1-121551-8
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Takuhiro Kakiuchi, Kyouhei Ikeda, Kazuhiko Mase, Shin-ichi Nagaoka. Local valence electronic states of silicon (sub)oxides on HfO2/Si-(sub)oxide/Si(110) and HfSi2/Si-(sub)oxide/Si(110) Islands. Surface Science. 2019. 681. 9-17
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MISC (17):
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垣内拓大, 白石朗, 山根亮太郎, 矢野貴大, 津田泰孝, 吉越章隆. Potential barrier for oxidation of HfSi2/Si(111) surface studied with super sonic O2 molecular beam. 日本表面真空学会学術講演会要旨集(Web). 2021. 2021
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垣内拓大, 山崎英輝, 塚田千恵, 塚田千恵, 吉越章隆. Si(100)-2×1清浄表面に作製したハフニウム超薄膜の酸素吸着と脱離. 分子科学討論会講演プログラム&要旨(Web). 2018. 12th. ROMBUNNO.2P049 (WEB ONLY)
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T. Kakiuchi, M. Yamasaki, K. Mase. Surface- and Interface-Selective Local Valence Electronic States of Ultrathin Hafnium Silicide Films Deposited on Clean Si(110) Surface. PF Act. Rep. 2016. 2017. 34
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垣内拓大, 中納佑二, 長岡伸一, 間瀬一彦. Si(110)-16×2シングルドメイン清浄表面への水素吸着過程とその表面物性. 物構研サイエンスフェスタ要旨集. 2015. 3rd
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Kakiuchi Takuhiro, Katsuragi Takuma, Nakano Yuji, Yoshigoe Akitaka, Nagaoka Shin-ichi, Mase Kazuhiko. Hafnium adsorption on clean Si(110)-16x2 single domain surface studied by low energy electron diffraction and electron spectroscopy. Abstract of annual meeting of the Surface Science of Japan. 2015. 35. 0. 138-138
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Lectures and oral presentations (69):
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Simultaneous progresses of oxidation and reduction during thermal oxygen molecules exposure to hafnium adsorbed germanium (100) surface
(The 85th JSAP Autumn meeting 2024 2024)
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Local/entire oxidation mechanism of hafnium absorbed Si(111)
(2023)
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Oxidation of non-equilibrium hafnium-adsorbed silicon (111) surface/interface induced by supersonic oxygen molecule beam irradiation
(2022)
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Potential barrier for oxidation of HfSi2/Si(111) surface studied with super sonic O2 molecular beam
(Annual Meeting of The Japan Society of Vacuum and Surface Science 2021)
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Oxidation dynamics at interface and surface of an ultrathin hafnium film on Si(111) substrate observed by core level spectroscopy
(2021)
more...
Education (5):
- 2006 - 2008 Graduate University for Advanced Studies School of High Energy Accelerator Science Department of Materials Structure Science
- - 2008 The Graduate University for Advanced Studies
- 2004 - 2006 Ehime University Graduate School of Science and Engineering
- 2000 - 2004 Ehime University Department of Chemistry
- - 2004 Ehime University Faculty of Science
Work history (3):
- 2023/04 - 現在 Ehime University Graduate school of science and engineering Associate Professor
- 2008/04 - 2023/03 Ehime University Graduate School of Science and Engineering Assistant Professor
- 2017/08 - 2018/08 Helmholtz Zentrum Berlin Methods and Instrumentation for Synchrotron Radiation Research Guest Researcher
Committee career (3):
- 2015/04 - 現在 愛媛大学理学同窓会 幹事
- 2023/04 - 2024/03 令和5年度 高校生おもしろ科学コンテスト 問題作成委員
- 2020/08 - 2020/08 愛媛大学Webオープンキャンパス理学部WG座長 オープンキャンパス理学部WG
Awards (2):
- 2020/12 - 愛媛大学理学部 理学部研究奨励賞
- 2019/12 - Faculty of Science, Ehime University Research Encouragement Prize
Association Membership(s) (4):
JAPAN SOCIETY FOR MOLECULAR SCIENCE
, THE SURFACE SCIENCE SOCIETY OF JAPAN
, THE PHYSICAL SOCIETY OF JAPAN
, THE CHEMICAL SOCIETY OF JAPAN
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