Rchr
J-GLOBAL ID：200901065446199520
Update date: Oct. 21, 2021
Ohtake Hiroto
オオタケ ヒロト | Ohtake Hiroto
Affiliation and department：
Job title：
Senior Assistant Professor or Senior Lecturer
MISC (26)：
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Shigeo Yasuhara, Juhyun Chung, Kunitoshi Tajima, Hisashi Yano, Shingo Kadomura, Masaki Yoshimaru, Noriaki Matsunaga, Tomohiro Kubota, Hiroto Ohtake, Seiji Samukawa. Structure-designable method to form super low-k SiOC film (k=2.2) by neutral-beam-enhanced chemical vapour deposition. JOURNAL OF PHYSICS D-APPLIED PHYSICS. 2009. 42. 5. 055208-1-055208-7
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Shigeo Yasuhara, Juhyun Chung, Kunitoshi Tajima, Hisashi Yano, Shingo Kadomura, Masaki Yoshimaru, Noriaki Matsunaga, Tomohiro Kubota, Hiroto Ohtake, Seiji Samukawa. Structure-designable method to form super low-k SiOC film (k=2.2) by neutral-beam-enhanced chemical vapour deposition. JOURNAL OF PHYSICS D-APPLIED PHYSICS. 2009. 42. 5. 055208-1-055208-7
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Michio Sato, Hiroto Ohtake, Koichi Suzuki, Seiji Samukawa. Real-time monitoring of successive sparks in high-density plasma chambers. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2007. 25. 6. 1594-1598
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Butsurin Jinnai, Toshiyuki Orita, Mamoru Konishi, Jun Hashimoto, Yoshinari Ichihashi, Akito Nishitani, Shingo Kadomura, Hiroto Ohtake, Seiji Samukawa. On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during SiO2 etching process. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2007. 25. 6. 1808-1813
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Michio Sato, Hiroto Ohtake, Koichi Suzuki, Seiji Samukawa. Real-time monitoring of successive sparks in high-density plasma chambers. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2007. 25. 6. 1594-1598
ｍore...
Committee career (3)：
- 2007 - 2007 The international symposium on AFI/TFI 2007 実行委員
- 2007 - The international conference on Solid State Devices and Materials 実行委員
- 2004 - ドライプロセスシンポジウム国際学会 論文委員
Association Membership(s) (4)：
The international conference on Solid State Devices and Materials
, The international symposium on AFI/TFI 2007
, ドライプロセスシンポジウム国際学会
, 応用物理学会
