Teramoto Akinobu

テラモトアキノブ | Teramoto Akinobu

Affiliation and department：
Job title：教授
Other affiliations (1)：

東北大学未来科学技術共同研究センター客員教授

Homepage URL (2)： http://www.rnbs.hiroshima-u.ac.jp/ , http://db.tohoku.ac.jp/whois/e_detail/1ec59f4a457a70c4acac497220c05f5b.html

Research field (2)： Electronic devices and equipment , Electric/electronic material engineering

Research keywords (3)： insulator , process , semiconductor

Research theme for competitive and other funds (11)：

2018 - 2019 超微細半導体用革新的ウェットプロセス・装置技術の開発
2016 - 信頼性、再現性の高い酸化膜形成技術開発とその手法を基礎とした閾値変動のないノーマリオフゲート構造の形成方法の構築
2008 - 2013 超高性能半導体集積回路製造技術の研究開発
2007 - 2009 超高感度・高分解能界面分析によるゲート絶縁膜/シリコン酸化膜の界面構造の決定
2006 - 2009 超高速・超低消費電力バランスドフルCMOSシステムLSIの研究

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Papers (395)：

Tetsuya Goto, Yoshinobu Shiba, Akinobu Teramoto, Yukio Kishi, Shigetoshi Sugawa. Effect of charge-up of surfaces of sintered Y<sub>2</sub>O<sub>3</sub> and yttrium oxyfluoride on their erosion rates due to ion bombardment. Journal of Vacuum Science & Technology B. 2022. 40. 6. 062205-062205
Takezo Mawaki, Akinobu Teramoto, Katsutoshi Ishii, Yoshinobu Shiba, Rihito Kuroda, Tomoyuki Suwa, Shuji Azumo, Akira Shimizu, Kota Umezawa, Yasuyuki Shirai, et al. Adsorption and surface reaction of isopropyl alcohol on SiO2 surfaces. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2022. 40. 5
Koga Saito, Hayato Suzuki, Hyeonwoo Park, Rihito Kuroda, Akinobu Teramoto, Tomoyuki Suwa, Shigetoshi Sugawa. A high-precision current measurement platform applied for statistical measurement of discharge current transient spectroscopy of traps in SiN dielectrics. Japanese Journal of Applied Physics. 2021. 60. 8. 086501-086501
Hsin Jyun Lin, Hiroshi Watanabe, Akinobu Teramoto, Rihito Kuroda, Kota Umezawa, Kiichi Furukawa, Shigetoshi Sugawa. Impact on the Conductance Method of the Asymmetry in the AC Response Induced by Interface Trap Levels. ECS Journal of Solid State Science and Technology. 2021. 10. 4
Takezo Mawaki, Akinobu Teramoto, Katsutoshi Ishii, Yoshinobu Shiba, Rihito Kuroda, Tomoyuki Suwa, Shuji Azumo, Akira Shimizu, Kota Umezawa, Yasuyuki Shirai, et al. Modification of copper and copper oxide surface states due to isopropyl alcohol treatment toward area-selective processes. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2021. 39. 1

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MISC (91)：

齊藤宏河, 鈴木達彦, 光田薫未, 間脇武蔵, 間脇武蔵, 諏訪智之, 寺本章伸, 寺本章伸, 須川成利, 黒田理人, et al. Statistical Measurement of Electrical Characteristics of Functional Thin Films Using Impedance Measurement Platform Technology. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2023. 84th
間脇武蔵, 寺本章伸, 石井勝利, 志波良信, 諏訪智之, 東雲秀司, 清水亮, 梅澤好太, 黒田理人, 白井泰雪, et al. Modification of states of copper and copper oxide due to IPA treatment. 電子情報通信学会技術研究報告(Web). 2021. 121. 71(SDM2021 22-29)
Operation Principle and Structure of Normally-off Floating Gate GaN HEMT with Injection Gate. 2020. 119. 408. 55-58
Operation Principle and Structure of Normally-off Floating Gate GaN HEMT with Injection Gate. 2020. 119. 409. 55-58
鈴木勇人, PARK Hyeonwoo, 寺本章伸, 寺本章伸, 黒田理人, 黒田理人, 諏訪智之, 須川成利, 須川成利. Large-Scale Evaluation of MIM Devices Using High-Precision Current Measurement Array Test Circuit. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2020. 67th

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Patents (157)：

電界効果トランジスタおよびその駆動方法
化合物半導体を洗浄する方法、化合物半導体の洗浄用の溶液、化合物半導体デバイスを作製する方法、窒化ガリウム基板を作製する方法、窒化ガリウム基板
半導体素子の形成方法
Semiconductor transistor
Method for rinsing compound semiconductor, solution for rinsing compound semiconductor containing gallium as constituent element, method for fabricating compound semiconductor device, method for fabricating gallium nitride substrate, and gallium nitride substrate

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Books (5)：

Different Types of Field-Effect Transistors - Theory and Applications
InTech 2017
dvances in Noise Analysis, Mitigation and Control
InTech 2016
Advanced Gate Stacks for High-Mobility Semiconductors
Springer 2007
Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing
Taylor & Francis 2006
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Fuji Techno System 2005 ISBN:4938555956

Lectures and oral presentations (367)：

SiNx Deposition at Low Temperature Using UV-Irradiated NH3
(235th ECS Meeting 2019)
Impact of Y-O-F Composition in Yttrium Oxyfluoride on Corrosion Resistance to Plasma Irradiation
(5th Annual World Congress of Smart Materials 2019)
An Electrical Impedance Biosensor Array for Tracking Moving Cells
(IEEE SENSORS 2018)
Corrosion Resistance to F and Cl plasma of Yttrium Oxyfluoride (YOF) formed by Sintering
(AVS 65th International Symposium 2018)
Effects of Process Gases and Gate TiN Electrode during the Post Deposition Anneal to ALD-Al2O3 Dielectric Film
(VS 65th International Symposium 2018)

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Education (3)：

2000 - 2001 Tohoku University Graduate School, Division of Engineering Electronic engineering
1990 - 1992 Tohoku University Graduate School of Engineering Electronic Engineering
1986 - 1990 Tohoku University Faculty of Engineering Electronic engineering

Professional career (3)：

Ph. D. (Tohoku University)
修士(工学) (東北大学)
学士(工学) (東北大学)

Work history (6)：

2019/06 - 現在 Tohoku University New Industry Creation Hatchery Center Visiting Professor
2019/06 - 現在 Hiroshima University Research Institute for Nanodevice and Bio Systems Professor
2014/07 - 2019/05 New Industry Creation Hatchery Center, Tohoku University Professor
2007/04 - 2014/06 New Industry Creation Hatchery Center, Tohoku University Associate professor
2002/04 - 2007/03 Associate Professor, New Industry Hatchery Center, Tohoku University,

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Committee career (7)：

2018/11 - 現在 2019 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES: SCIENCE AND TECHNOLOGY Program Committee
2016/04 - 現在電子デバイス界面テクノロジー研究会実行・プログラム委員
2019/07 - 2020/03 応用物理学会中国四国支部幹事
2019/07 - 2019/12 応用物理学会先進パワー半導体分科会先進パワー半導体分科会第6回講演会実行委員
2004/07 - 2015/03 応用物理学会ゲートスタック研究会実行・プログラム委員

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Awards (2)：

2014/09 - The Japan Society of Applied Physics Outstanding Paper Award Chemical Structure of Interfacial Transition Layer Formed on Si(100) and Its Dependence on Oxidation Temperature, Annealing in Forming Gas, and Difference in Oxidizing Species
2008/10 - 日本真空協会日本真空協会第33回熊谷記念真空科学論文賞 X-ray Photoelectron Spectroscopic Study of Nitrogen Depth Profile in Radical Nitrided Silicon Oxynitride Film

Association Membership(s) (6)：

The Electrochemical Society , The Institute of Electronics, Information and Communication Engineers , IEEE , The Japan Society of Applied Physics , The Japan Society of Vacuum and Surface Science , American Vacuum Society

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