Rchr
J-GLOBAL ID:200901066811423466   Update date: Feb. 10, 2023

Teramoto Akinobu

テラモト アキノブ | Teramoto Akinobu
Affiliation and department:
Job title: 教授
Other affiliations (1):
  • 東北大学  未来科学技術共同研究センター   客員教授
Homepage URL  (2): http://www.rnbs.hiroshima-u.ac.jp/http://db.tohoku.ac.jp/whois/e_detail/1ec59f4a457a70c4acac497220c05f5b.html
Research field  (2): Electronic devices and equipment ,  Electric/electronic material engineering
Research keywords  (3): insulator ,  process ,  semiconductor
Research theme for competitive and other funds  (11):
  • 2018 - 2019 超微細半導体用革新的ウェットプロセス・装置技術の開発
  • 2016 - 信頼性、再現性の高い酸化膜形成技術開発と その手法を基礎とした閾値変動のない ノーマリオフゲート構造の形成方法の構築
  • 2008 - 2013 超高性能半導体集積回路製造技術の研究開発
  • 2007 - 2009 超高感度・高分解能界面分析によるゲート絶縁膜/シリコン酸化膜の界面構造の決定
  • 2006 - 2009 超高速・超低消費電力バランスドフルCMOSシステムLSIの研究
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Papers (390):
more...
MISC (90):
Patents (157):
  • 電界効果トランジスタおよびその駆動方法
  • 化合物半導体を洗浄する方法、化合物半導体の洗浄用の溶液、化合物半導体デバイスを作製する方法、窒化ガリウム基板を作製する方法、窒化ガリウム基板
  • 半導体素子の形成方法
  • Semiconductor transistor
  • Method for rinsing compound semiconductor, solution for rinsing compound semiconductor containing gallium as constituent element, method for fabricating compound semiconductor device, method for fabricating gallium nitride substrate, and gallium nitride substrate
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Books (5):
  • Different Types of Field-Effect Transistors - Theory and Applications
    InTech 2017
  • dvances in Noise Analysis, Mitigation and Control
    InTech 2016
  • Advanced Gate Stacks for High-Mobility Semiconductors
    Springer 2007
  • Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing
    Taylor & Francis 2006
  • -
    Fuji Techno System 2005 ISBN:4938555956
Lectures and oral presentations  (367):
  • SiNx Deposition at Low Temperature Using UV-Irradiated NH3
    (235th ECS Meeting 2019)
  • Impact of Y-O-F Composition in Yttrium Oxyfluoride on Corrosion Resistance to Plasma Irradiation
    (5th Annual World Congress of Smart Materials 2019)
  • An Electrical Impedance Biosensor Array for Tracking Moving Cells
    (IEEE SENSORS 2018)
  • Corrosion Resistance to F and Cl plasma of Yttrium Oxyfluoride (YOF) formed by Sintering
    (AVS 65th International Symposium 2018)
  • Effects of Process Gases and Gate TiN Electrode during the Post Deposition Anneal to ALD-Al2O3 Dielectric Film
    (VS 65th International Symposium 2018)
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Education (3):
  • 2000 - 2001 Tohoku University Graduate School, Division of Engineering Electronic engineering
  • 1990 - 1992 Tohoku University Graduate School of Engineering Electronic Engineering
  • 1986 - 1990 Tohoku University Faculty of Engineering Electronic engineering
Professional career (3):
  • Ph. D. (Tohoku University)
  • 修士(工学) (東北大学)
  • 学士(工学) (東北大学)
Work history (6):
  • 2019/06 - 現在 Tohoku University New Industry Creation Hatchery Center Visiting Professor
  • 2019/06 - 現在 Hiroshima University Research Institute for Nanodevice and Bio Systems Professor
  • 2014/07 - 2019/05 New Industry Creation Hatchery Center, Tohoku University Professor
  • 2007/04 - 2014/06 New Industry Creation Hatchery Center, Tohoku University Associate professor
  • 2002/04 - 2007/03 Associate Professor, New Industry Hatchery Center, Tohoku University,
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Committee career (7):
  • 2018/11 - 現在 2019 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES: SCIENCE AND TECHNOLOGY Program Committee
  • 2016/04 - 現在 電子デバイス界面テクノロジー研究会 実行・プログラム委員
  • 2019/07 - 2020/03 応用物理学会中国四国支部 幹事
  • 2019/07 - 2019/12 応用物理学会 先進パワー半導体分科会 先進パワー半導体分科会第6回講演会実行委員
  • 2004/07 - 2015/03 応用物理学会ゲートスタック研究会 実行・プログラム委員
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Awards (2):
  • 2014/09 - The Japan Society of Applied Physics Outstanding Paper Award Chemical Structure of Interfacial Transition Layer Formed on Si(100) and Its Dependence on Oxidation Temperature, Annealing in Forming Gas, and Difference in Oxidizing Species
  • 2008/10 - 日本真空協会 日本真空協会第33回熊谷記念真空科学論文賞 X-ray Photoelectron Spectroscopic Study of Nitrogen Depth Profile in Radical Nitrided Silicon Oxynitride Film
Association Membership(s) (6):
The Electrochemical Society ,  The Institute of Electronics, Information and Communication Engineers ,  IEEE ,  The Japan Society of Applied Physics ,  The Japan Society of Vacuum and Surface Science ,  American Vacuum Society
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