Motoyasu IMAMURA. Study on the behavior of the photoelectrons with lower energies in the ultra thin film of silicon oxide. Photon Factory Activity Report 2017. 2018. 35. 202
Motoyasu Imamura, Eiichi Kobayashi, Masahiro Sasaki. Erratum: ``Depth analysis on oxidation of Al/Si(111) thin film by X-ray photoelectron spectroscopy using synchrotron radiation''. Japanese Journal of Applied Physics. 2016. 55. 10. 109201-109201
Determination of effective attenuation length in silicon oxide thin films using synchrotron radiation
(Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science 2019)
Measurement of Ro for the determination of the thicknesses of silicon oxide in low energy region.
(Abstract of annual meeting of the Surface Science of Japan 2017)
Al/Si(111)薄膜のO2による吸着酸化過程
(第23回日本放射光学会年会 2010)
Depth Analysis on Oxidation of Al/SI Films Using SR-XPS
(7th International Symposium on Atomic Level Characterizations for New Materials and Devices '09 2009)