In-situ Monitoring of Incident Ion Flux Based on High-Energy Secondary Electron Measurements in Plasma Immersion Ion Implantation(共著). Abstract of 5th International Workshop on Plasma-Based Ion Implantation. 1999
In Situ Process Monitoring in Plasma Immersion Ion Implantation Based on Measurements of Secondary Electron Emission Coefficient
Surface and Coating Technology 2002
In Situ Process Monitoring in Plasma Immersion Ion Implantation Based on Measurements of Secondary Electron Emission Coefficient
Surface and Coating Technology 2002
Education (2):
- 1990 Nagoya University
- 1990 Nagoya University Graduate School, Division of Engineering