Art
J-GLOBAL ID：200902050911096250   Reference number：90A0595989

Reaction analysis and design of thin film CVD by quantum chemistry.

量子化学による薄膜CVDの反応解析と設計
Author (2)：
SATO KOTA

About SATO KOTA

(千葉大 工)

About 千葉大 工

, 
KOINUMA HIDEOMI

About KOINUMA HIDEOMI

(東京工大 工材研)

About 東京工大 工材研


Material：
化学  (Chemistry)

About 化学


Volume： 45  Issue： 7  Page： 508-509  Publication year： Jul. 1990 
JST Material Number： F0095A  ISSN： 0451-1964  CODEN： KAKYAU  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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chemical vapor deposition

About chemical vapor deposition

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
反応素過程

About 反応素過程

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films 
(BK14040E)

About Semiconductor thin films

,  Other noncatalytic reactions 
(CB06070U)

About Other noncatalytic reactions

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
量子化学

About 量子化学

, 
薄膜

About 薄膜

, 
CVD

About CVD

, 
解析

About 解析

, 
設計

About 設計


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