Art
J-GLOBAL ID：200902071211449337
Reference number：85A0371873
Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering.
反応性マグネトロンスパッタリング法による単結晶TiN膜の成長とその性質
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Author (5)：
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Material：
Volume：
3
Issue：
2
Page：
303-307
Publication year：
Mar. 1985
JST Material Number：
C0789B
ISSN：
0734-2101
CODEN：
JVTAD6
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
Thesaurus term：
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Thin films of other inorganic compounds
Terms in the title (5)：
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Keywords automatically extracted from the title.
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