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J-GLOBAL ID:200902071211449337   Reference number:85A0371873

Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering.

反応性マグネトロンスパッタリング法による単結晶TiN膜の成長とその性質
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Volume:Issue:Page: 303-307  Publication year: Mar. 1985 
JST Material Number: C0789B  ISSN: 0734-2101  CODEN: JVTAD6  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Thin films of other inorganic compounds 
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