Art
J-GLOBAL ID:200902105624321381   Reference number:01A0264704

Ion-assisted deposition of copper using an inverter plasma.

インバータプラズマを用いた銅のイオン支援蒸着
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Material:
Volume: 136  Issue: 1/3  Page: 273-275  Publication year: Feb. 02, 2001 
JST Material Number: D0205C  ISSN: 0257-8972  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Metallic thin films 
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